Delamination-supported growth of hydrides in Pd thin films studied by electrochemical hydrogenography
Delamination-supported growth of hydrides in Pd thin films studied by electrochemical hydrogenography
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通过电化学氢谱法研究 Pd 薄膜中氢化物分层支持的生长
DOI：
10.1016/j.jallcom.2014.01.026
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发表时间：
2014
影响因子：
6.2
通讯作者：
A. Pundt
中科院分区：
文献类型：
--
作者：
J. Kürschner;S. Wagner;A. Pundt
采用电化学氢化技术研究了在改性的pd薄膜上氢化物的成核和生长。改性由一种nb粘合剂控制。发现附着力对氢化物形成有明显的影响。黏附膜显示的小氢化物远远超出了该方法的分辨率限制。与此相反，弱黏附膜的成核密度低，且在μm范围内有大量分离的氢化物。这种差异归因于准无应力体积中氢化物形成的增强，以及支持氢化物生长的易于扩展的分层前沿。
Hydride nucleation and growth is studied by electrochemical hydrogenography on Pd-thin films with modified adhesion between the film and the glass substrate. Modification was controlled by a Nb-adhesive. A clear influence of the adhesion on the hydride formation was found. The adhering films showed small hydrides far beyond the resolution limit of the method. Contrary to this, the weak-adhering films showed low nucleation densities and large separated hydrides extending in the μm-range. The difference was attributed to enhanced hydride formation in quasi stress-free volumes and an easily propagating delamination front that supports hydride growth.
氢显微镜 â 屈曲铌氢薄膜中氢的分布
影响因子：
7.2
作者：
Stefan Wagner;Marcus Moser;Christoph Greubel;Katrin Peeper;Patrick Reichart;Astrid Pundt;Günther Dollinger
通讯作者：
Günther Dollinger