Mesoscopic physical removal of material using sliding nano-diamond contacts.
Mesoscopic physical removal of material using sliding nano-diamond contacts.
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DOI：
10.1038/s41598-018-21171-w
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发表时间：
2018-02-14
影响因子：
4.6
通讯作者：
Vandervorst W
中科院分区：
文献类型：
--
作者：
Celano U;Hsia FC;Vanhaeren D;Paredis K;Nordling TEM;Buijnsters JG;Hantschel T;Vandervorst W
磨损机制包括纳米尺度的断裂和塑性变形是理解滑动接触的核心。最近，针尖引起的材料腐蚀与AFM的二次成像模式的传感能力的组合，使一个切片和视图的断层扫描技术，称为AFM断层扫描或手术刀SPM。然而，难以捉摸的法律纳米级的磨损和大量的原子参与的尖端样品接触，需要一个专门的介观尺度的描述来理解和模拟尖端诱导的材料去除。在这里，我们研究纳米级的滑动接触金刚石的制度，其中数千纳米3被删除。我们探讨了各种材料的高压尖端诱导材料去除的基本原理。加载力的变化系统地与AFM和SEM相结合，以增加理解和过程可控性。去除率与负载力的非线性变化被解释为两个接触制度的组合，每个占主导地位的一个特定的力范围。通过使用这两个制度之间的逐渐过渡，（1）每个针尖通道上的材料侵蚀的实验速率建模，（2）一个可控的去除率低于5 nm/扫描的所有材料被证明，从而打开了未来的发展三维层析AFM。
Wear mechanisms including fracture and plastic deformation at the nanoscale are central to understand sliding contacts. Recently, the combination of tip-induced material erosion with the sensing capability of secondary imaging modes of AFM, has enabled a slice-and-view tomographic technique named AFM tomography or Scalpel SPM. However, the elusive laws governing nanoscale wear and the large quantity of atoms involved in the tip-sample contact, require a dedicated mesoscale description to understand and model the tip-induced material removal. Here, we study nanosized sliding contacts made of diamond in the regime whereby thousands of nm3 are removed. We explore the fundamentals of high-pressure tip-induced material removal for various materials. Changes in the load force are systematically combined with AFM and SEM to increase the understanding and the process controllability. The nonlinear variation of the removal rate with the load force is interpreted as a combination of two contact regimes each dominating in a particular force range. By using the gradual transition between the two regimes, (1) the experimental rate of material eroded on each tip passage is modeled, (2) a controllable removal rate below 5 nm/scan for all the materials is demonstrated, thus opening to future development of 3D tomographic AFM.
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影响因子：
64.8
作者：
Luan, BQ;Robbins, MO
通讯作者：
Robbins, MO
影响因子：
64.8
作者：
Mo, Yifei;Turner, Kevin T.;Szlufarska, Izabela
通讯作者：
Szlufarska, Izabela
影响因子：
56.7
作者：
Luria, Justin;Kutes, Yasemin;Huey, Bryan D.
通讯作者：
Huey, Bryan D.
影响因子：
9.5
作者：
Buijnsters, Josephus G.;Tsigkourakos, Menelaos;Vandervorst, Wilfried
通讯作者：
Vandervorst, Wilfried
影响因子：
56.9
作者：
KIM, Y;LIEBER, CM
通讯作者：
LIEBER, CM