Nondestructive and nonpreparative chemical nanometrology of internal material interfaces at tunable high information depths.
Nondestructive and nonpreparative chemical nanometrology of internal material interfaces at tunable high information depths.
复制标题
在可调的高信息深度下对内部材料界面进行非破坏性和非制备性化学纳米计量
DOI：
10.1021/ac3024872
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发表时间：
--
影响因子：
7.4
通讯作者：
B. Beckhoff
中科院分区：
文献类型：
--
作者：
B. Pollakowski;P. Hoffmann;M. Kosinova;O. Baake;V. Trunova;R. Unterumsberger;W. Ensinger;B. Beckhoff
功能纳米器件性能的改善涉及新材料、更复杂的结构和先进的工艺过程。向较重元素和较厚层的过渡限制了对内部材料界面的化学和物理表征的访问。传统的非破坏性表征技术，如X射线光电子能谱法遭受灵敏度和定量的限制，而破坏性的技术，如离子质谱法可以修改内部接口的化学性质。因此，需要新的方法提供足够的灵敏度，可靠的定量，和高的信息深度，以揭示界面参数的研发挑战的纳米尺度。适用于纳米尺度样品的测量策略使近边缘X射线吸收精细结构和掠入射X射线荧光的组合能够实现内部材料界面的化学纳米测量。它们的验证是在纳米层模型结构上进行的，该结构由硅衬底、物理气相沉积的Ni金属层以及顶部的化学气相沉积的BxCyNzlight元素层组成。
Improvement in the performance of functional nanoscaled devices involves novel materials, more complex structures, and advanced technological processes. The transitions to heavier elements and to thicker layers restrict access to the chemical and physical characterization of the internal material interfaces. Conventional nondestructive characterization techniques such as X-ray photoelectron spectroscopy suffer from sensitivity and quantification restrictions whereas destructive techniques such as ion mass spectrometry may modify the chemical properties of internal interfaces. Thus, novel methods providing sufficient sensitivity, reliable quantification, and high information depths to reveal interfacial parameters are needed for R&D challenges on the nanoscale. Measurement strategies adapted to nanoscaled samples enable the combination of Near-Edge X-ray Absorption Fine Structure and Grazing Incidence X-ray Fluorescence to allow for chemical nanometrology of internal material interfaces. Their validation has been performed at nanolayered model structures consisting of a silicon substrate, a physically vapor deposited Ni metal layer, and, on top, a chemically vapor deposited BxCyNzlight element layer.
影响因子：
2.1
作者：
M. Mannan;Y. Baba;T. Kida;M. Nagano;I. Shimoyama;N. Hirao;H. Noguchi
通讯作者：
M. Mannan;Y. Baba;T. Kida;M. Nagano;I. Shimoyama;N. Hirao;H. Noguchi
影响因子：
7.4
作者：
Beckhoff, Burkhard;Fliegauf, Rolf;Ulm, Gerhard
通讯作者：
Ulm, Gerhard
X 射线驻波：一种薄层系统的方法
影响因子：
3.4
作者：
M. Krämer;A. Bohlen;C. Sternemann;M. Paulus;R. Hergenröder
通讯作者：
R. Hergenröder