Magnetic g-C3N4/NiFe2O4 composite with enhanced activity on photocatalytic disinfection of Aspergillus flavus
Magnetic g-C3N4/NiFe2O4 composite with enhanced activity on photocatalytic disinfection of Aspergillus flavus
复制标题
磁性g-C3N4/NiFe2O4复合材料对黄曲霉菌光催化消毒活性增强
DOI:
10.1016/j.cej.2021.129417
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发表时间:
2021-03
影响因子:
15.1
通讯作者:
Li Peiwu
中科院分区:
文献类型:
--
作者:
Sun Di;Mao Jin;Cheng Ling;Yang Xianglong;Li Hui;Zhang Liangxiao;Zhang Wen;Zhang Qi;Li Peiwu
Aspergillus flavuscan cause crop loss and produce mycotoxin that bring serious threats to human health. The large usage of chemical pesticides or fungicides might cause environmental problems and fungal resistance. Therefore, developing the novel, low possibility of resistance and pro-environment way to control and reduce this fungi is meaningful. Herein, an efficient, environmental-friendly and photocatalytic method to disinfectAspergillus flavuswas demonstrated on magnetic and Z-schematic composites. The composites were composed of rhombic NiFe2O4nanosheets and g-C3N4nanosized sheets, and 0.2 g-C3N4/NiFe2O4(mass ratio) showed the excellent activity with above 90% disinfection rate under 90 min visible light irradiation. The efficient disinfection activities were ascribed to the favorable charges separation, well photoelectric properties and suitable band structure. It was found that the •O2−and •OH were the main active radical species in photocatalytic disinfection. The attack of these species could cause the destruction of fungal cell structure and the leakage of intracellular contents as proved by the fluorescence staining of spores, biological scanning electron microscope and the detection of extracellular protein and DNA. Moreover, the composites also showed high photocatalytic disinfection activity ofAspergillus flavuson peanuts, which can reduce aflatoxin B1from 315.21 µg kg−1to 18.50 µg kg−1. This efficient method might be considered as a potential way to control the contamination ofAspergillus flavus, and as a reference to the mitigation of other pathogenic fungi in future.
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DOI:
10.1146/annurev-pathol-052016-100342
发表时间:
2017-01-24
期刊:
Annual review of pathology
影响因子:
--
作者:
Wheeler ML;Limon JJ;Underhill DM
通讯作者:
Underhill DM
影响因子:
9.5
作者:
Jingtao Zhang;Yang Liu;Qi Li;Xiaoping Zhang;J. Shang
通讯作者:
Jingtao Zhang;Yang Liu;Qi Li;Xiaoping Zhang;J. Shang
影响因子:
64.8
作者:
Felicia Wu
通讯作者:
Felicia Wu
影响因子:
22.1
作者:
Wang, Wei;Fang, Jiaojiao;Lu, Chunhua
通讯作者:
Lu, Chunhua
影响因子:
10.9
作者:
Hang Ngoc Nguyen;Chaves-Lopez, Clemencia;Rodrigues, Debora E.
通讯作者:
Rodrigues, Debora E.