Influence of annealing temperature on structural, optical and electrical properties of AZO/Pd/AZO films
Influence of annealing temperature on structural, optical and electrical properties of AZO/Pd/AZO films
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退火温度对AZO/Pd/AZO薄膜结构、光学和电学性能的影响
DOI：
10.1016/j.solmat.2016.04.015
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发表时间：
2016-08
影响因子：
6.9
通讯作者：
Gu Haoshuang
中科院分区：
文献类型：
--
作者：
Zhang Weihai;Xiong Juan;Liu Lei;Zhang Xianghui;Gu Haoshuang
采用磁控溅射法在玻璃衬底上制备了一种新型的三层结构AZO/Pd/AZO（阿帕）透明导电薄膜。系统地研究了不同Pd层厚度和氢气气氛下退火温度对阿帕薄膜的结构、形貌、电学和光学性能的影响。实验结果表明，阿帕薄膜为多晶结构，具有（002）择优取向.与未退火的薄膜相比，氢气氛下退火的阿帕薄膜的电阻率从1.84×10−3Ω cm迅速下降到4.8×10−4Ω cm，而透射率随着退火温度的升高而略有下降。光学测量结果表明，在200 °C ~ 500 °C范围内，退火温度对阿帕薄膜的光学带隙（Eg）的影响为3.37 ~ 3.69 eV。AZO（50 nm）/Pd（7 nm）/AZO（50 nm）结构经400 °C氢气退火后，获得了4.8×10−4Ω cm的极低电阻率，方块电阻为45 Ω/sq，透射率为83.2%，优值为3.53×10−3Ω− 1。这些结果支持了在透明金属氧化物电极中插入Pd以提高其氢敏性能。
A novel triple-layered transparent conductive film, AZO/Pd/AZO (APA), was deposited via magnetron sputtering on glass substrate at room temperature. The structural, morphological, electrical and optical properties of the APA films were systematically investigated with various Pd layer thicknesses and annealing temperatures in hydrogen atmosphere. The experiment results show that APA films are polycrystalline with a preferred (002) orientation. Comparing with that for the un-annealed films, the resistivity of APA film annealed in hydrogen atmosphere rapidly decreases from 1.84×10−3Ω cm to 4.8×10−4Ω cm, while the transmittance decreased slightly with increasing annealing temperature to 400 °C. Optical measurements indicated that the optical band gap (Eg) of APA films varies from 3.37 eV to 3.69 eV with adjusting annealing temperature from 200 °C to 500 °C. The very low resistivity of 4.8×10−4Ω cm with a sheet resistance of 45 Ω/sq, a transmittance of 83.2% and a figure of merit value of 3.53×10−3Ω−1were obtained by AZO (50 nm)/Pd (7 nm)/AZO (50 nm) structure after hydrogen annealing at 400 °C. These results support that the use of Pd insertion in transparent metal oxide electrode for its hydrogen sensitive property.
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影响因子：
6.9
作者：
Cong-sheng Tian;Xinliang Chen;J. Ni;Jie-ming Liu;Dekun Zhang;Qian Huang;Ying Zhao;Xiaodang Zhang
通讯作者：
Cong-sheng Tian;Xinliang Chen;J. Ni;Jie-ming Liu;Dekun Zhang;Qian Huang;Ying Zhao;Xiaodang Zhang
影响因子：
6.6
作者：
Baoyun Yu;Wenjuan Wen;Wenpeng Li;Yang Yang-Yang;Dandan Hou;Changshuo Liu
通讯作者：
Baoyun Yu;Wenjuan Wen;Wenpeng Li;Yang Yang-Yang;Dandan Hou;Changshuo Liu
影响因子：
6.9
作者：
Chung-Hyeon Lee;R. Pandey;Byung-Yong Wang;W. Choi;D. Choi;Y. Oh
通讯作者：
Chung-Hyeon Lee;R. Pandey;Byung-Yong Wang;W. Choi;D. Choi;Y. Oh
DOI：
10.1002/pssa.201228014
发表时间：
2012-07
期刊：
physica status solidi (a)
影响因子：
--
作者：
B. Zhu;J. Wang;S. Zhu;J. Wu;D. Zeng;C. Xie
通讯作者：
B. Zhu;J. Wang;S. Zhu;J. Wu;D. Zeng;C. Xie
DOI：
10.1088/0370-1301/67/10/306
发表时间：
1954-01-01
期刊：
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B
影响因子：
--
作者：
MOSS, TS
通讯作者：
MOSS, TS