A practical ply-based appearance model of woven fabrics
A practical ply-based appearance model of woven fabrics
复制标题
实用的基于层数的机织物外观模型
DOI:
10.1145/3414685.3417777
复制
发表时间:
2020
影响因子:
6.2
通讯作者:
Jensen, Henrik Wann
中科院分区:
文献类型:
--
作者:
Montazeri, Zahra;Gammelmark, Søren B.;Zhao, Shuang;Jensen, Henrik Wann
Simulating the appearance of woven fabrics is challenging due to the complex interplay of lighting between the constituent yarns and fibers. Conventional surface-based models lack the fidelity and details for producing realistic close-up renderings. Micro-appearance models, on the other hand, can produce highly detailed renderings by depicting fabrics fiber-by-fiber, but become expensive when handling large pieces of clothing. Further, neither surface-based nor micro-appearance model has not been shown in practice to match measurements of complex anisotropic reflection and transmission simultaneously.In this paper, we introduce a practical appearance model for woven fabrics. We model the structure of a fabric at the ply level and simulate the local appearance of fibers making up each ply. Our model accounts for both reflection and transmission of light and is capable of matching physical measurements better than prior methods including fiber based techniques. Compared to existing micro-appearance models, our model is light-weight and scales to large pieces of clothing.
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DOI:
10.1145/2024156.2024179
发表时间:
2011-12
期刊:
Proceedings of the 2011 SIGGRAPH Asia Conference
影响因子:
--
作者:
Hongzhi Wu;Julie Dorsey;H. Rushmeier
通讯作者:
Hongzhi Wu;Julie Dorsey;H. Rushmeier
DOI:
10.1145/3272127.3275105
发表时间:
2018-12
期刊:
ACM Transactions on Graphics (TOG)
影响因子:
--
作者:
Jonathan Leaf;Rundong Wu;Eston Schweickart;Doug L. James;Steve Marschner
通讯作者:
Jonathan Leaf;Rundong Wu;Eston Schweickart;Doug L. James;Steve Marschner
DOI:
10.1145/1008653.1008663
发表时间:
2003
期刊:
ACM Transactions on Graphics (TOG)
影响因子:
--
作者:
Neeharika Adabala;N. Magnenat;Guangzheng Fei
通讯作者:
Guangzheng Fei
DOI:
10.1145/97879.97885
发表时间:
1990-09
期刊:
Proceedings of the 17th annual conference on Computer graphics and interactive techniques
影响因子:
--
作者:
N. Max
通讯作者:
N. Max
影响因子:
6.2
作者:
I. Sadeghi;Heather Pritchett;H. Jensen;Rasmus Tamstorf
通讯作者:
Rasmus Tamstorf