Dispersion and microwave processing of nano-sized ITO powder for the fabrication of transparent conductive oxides
Dispersion and microwave processing of nano-sized ITO powder for the fabrication of transparent conductive oxides
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用于制造透明导电氧化物的纳米 ITO 粉末的分散和微波处理
DOI:
10.1016/j.ceramint.2016.08.157
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发表时间:
2016
影响因子:
5.2
通讯作者:
Ghanizadeh S
中科院分区:
文献类型:
--
作者:
Ghanizadeh S
Aqueous dispersions of tin-doped indium oxide (ITO) nanopowder were prepared and the effect of the addition of PEG 400, Tween 80 and β-alanine as dispersants was investigated using zeta potential and particle size distribution measurements. Both PEG 400 and β-alanine were found to produce stable dispersions that were used to deposit ITO thin films on glass substrates by dip and spin coating methods. The ITO thin films were heat-treated using both conventional and microwave heat treatment in order to improve the inter-particle connections and hence the resistivity and transparency of the films. All the films exhibited an average transmittance of >80% over the visible spectrum after being subjected to the heat treatment process. ITO films prepared with no dispersant showed very high resistivity values for both heating methods, however addition of 2 wt% PEG 400 to the dispersion yielded a reduction in the resistivity values to 1.4×10−1Ω cm and 3.8×10−2Ω cm for conventionally and microwave treated films, respectively. The surface morphological studies confirmed that addition of dispersants improved the film uniformity and inter-particle connections of the ITO films considerably.
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DOI:
10.1007/bf01499825
发表时间:
1963
期刊:
Kolloid-Zeitschrift und Zeitschrift für Polymere
影响因子:
--
作者:
K. Nand;Satyeshwar Ghosh
通讯作者:
Satyeshwar Ghosh
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
A. Tahir;T. A. Peiris;K. Wijayantha
通讯作者:
K. Wijayantha
DOI:
10.1016/j.colsurfa.2005.09.046
发表时间:
2006
期刊:
Colloids and Surfaces A: Physicochemical and Engineering Aspects
影响因子:
--
作者:
W. Tseng;F. Tzeng
通讯作者:
F. Tzeng
影响因子:
1.2
作者:
Sung‐Jei Hong;Jong‐Woong Kim;Jaewon Lim;G. Choi;M. Isshiki
通讯作者:
M. Isshiki
影响因子:
9.2
作者:
P. Kalyani;N. Kalaiselvi;N. Renganathan
通讯作者:
N. Renganathan