11–13GHz electron cyclotron resonance plasma source using cylindrically comb-shaped magnetic-field configuration for broad ion-beam processing
11–13GHz electron cyclotron resonance plasma source using cylindrically comb-shaped magnetic-field configuration for broad ion-beam processing
复制标题
11–13GHz 电子回旋共振等离子体源，采用圆柱形梳状磁场配置，用于宽离子束处理
DOI：
10.1063/1.2387885
复制
发表时间：
2006
影响因子：
1.6
通讯作者：
Junji Saito
中科院分区：
文献类型：
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作者：
T. Asaji;Y. Kato;F. Sato;T. Iida;Junji Saito
用于宽离子束处理的电子回旋共振 (ECR) 等离子体源已通过圆柱形梳状磁场配置和 11–13GHz 频率微波进行升级。一对梳状磁铁围绕着大口径放电室。磁场很好地限制了等离子体，抑制了等离子体向圆柱形腔室的轴向方向的扩散。磁场由多极和两个准永磁体构成。与简单的多极磁场配置相比，等离子体密度明显增加。行波管放大器输出的微波频率可以通过输入信号源轻松改变。 13GHz 的等离子体密度高于 11GHz。在微波功率仅为350W、压力为1.0Pa时，最大等离子体密度已达到约1018m−3。已经研究了通过二次谐波谐振和微波模式增强等离子体的产生。等离子体密度...
An electron cyclotron resonance (ECR) plasma source for broad ion-beam processing has been upgraded by a cylindrically comb-shaped magnetic-field configuration and 11–13GHz frequency microwaves. A pair of comb-shaped magnets surrounds a large-bore discharge chamber. The magnetic field well confines plasmas with suppressing diffusion toward the axial direction of the cylindrical chamber. The magnetic field is constructed with a multipole and two quasiring permanent magnets. The plasma density clearly increases as compared with that in a simple multipole magnetic-field configuration. The frequency of microwaves output from the traveling-wave tube amplifier can be easily changed with an input signal source. The plasma density for 13GHz is higher than that for 11GHz. The maximum plasma density has reached approximately 1018m−3 at a microwave power of only 350W and a pressure of 1.0Pa. The enhancement of plasma generation by second-harmonic resonance and microwave modes has been investigated. The plasma densit...
Heliotron J 中二次谐波电子回旋波等离子体击穿实验研究
DOI：
--
发表时间：
2005
期刊：
Nuclear Fusion 45
影响因子：
--
作者：
K.Nagasaki;et al.
通讯作者：
et al.
通过循环注入 CH4/H2/Ar 和 O2 对 III-V 半导体进行电子回旋共振反应离子蚀刻
DOI：
--
发表时间：
2002
期刊：
Digest of Papers, International Microprocesses and Nanotechnology Conference 7B-5-2
影响因子：
--
作者：
Seok-Hwan Jeong;Tetsuya Mizumoto;Mitsuru Takenaka;Yoshiaki Nakano;Katsumi Nakatsuhara;片桐祥雅;Nutchai Sroymadee;Seok-Hwan Jeong;Doo Gun Kim;Seok-Hwan Jeong;Yoshiaki Nakano;Seok-Hwan Jeong;Mitsuru Takenaka;Seok-Hwan Jeong;K.-N.Hong;Mitsuru Takenaka;K.-N.Hong;Nobuo Haneji
通讯作者：
Nobuo Haneji