Modification of structure and wear resistance of closed-field unbalanced-magnetron sputtered MoS2 film by vacuum-heat-treatment
Modification of structure and wear resistance of closed-field unbalanced-magnetron sputtered MoS2 film by vacuum-heat-treatment
复制标题
真空热处理对闭场不平衡磁控溅射MoS2薄膜结构及耐磨性的改性
DOI：
10.1016/j.surfcoat.2020.126215
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发表时间：
2020-11
期刊：
影响因子：
--
通讯作者：
Xiaoming Gao
中科院分区：
文献类型：
--
作者：
Rui Zhang;Qifeng Cui;Weng Lijun;Sun Jiayi;Ming Hu;Yanlong Fu;Desheng Wang;Jiang Dong;Xiaoming Gao
摘要 采用闭场不平衡磁控溅射（CFUBMS）技术沉积MoS2薄膜，并通过真空环境下100~500°C的热处理改变其结构和摩擦学性能。结果表明，沉积态MoS2薄膜由MoS2加少量MoO3组成，具有致密的类非晶结构。真空热处理后，MoS2薄膜仍然非常致密，但随着热处理温度的升高，其微观结构由非晶态转变为纳米晶态。结果，在200℃的中温下获得了具有MoS2纳米晶体嵌入其自身非晶基体中的微结构的MoS2薄膜。此外，经过400℃和500℃高温真空热处理后，薄膜中的MoO3相还原为MoO2。摩擦试验表明，通过适当温度的真空热处理，MoS2薄膜在真空环境下的耐磨性能得到显着提高。真空热处理后的MoS2薄膜在200℃下3h的磨损寿命约为6.2×105r，比沉积态MoS2薄膜的磨损寿命长约4倍。
Abstract MoS2 film deposited was deposited by closed-field unbalanced-magnetron sputtering (CFUBMS), and its structural and tribological properties were modified by the heat treatment at temperature range of 100–500°C in vacuum environment. Results revealed that as-deposited MoS2 film was composed of MoS2 plus a little MoO3 with a dense amorphous-like structure. After the vacuum heat treatment, MoS2 film was still very compact, but its microstructure was changed from amorphous-like to nano-crystalline states with the increase of heat treatment temperature. As a result, a MoS2 film with a microstructure of MoS2 nanocrystals embedded into its own amorphous matrix was obtained at middle temperature of 200°C. Furthermore, MoO3 phase in the film was reduced to MoO2 after the vacuum heat treatment at high temperatures of 400 and 500°C. Friction tests revealed that the wear resistance of MoS2 film in vacuum environment was significantly improved by the vacuum heat treatment at suitable temperature. The wear life of vacuum-heat-treated MoS2 film at 200°C for 3h was ~6.2×105r, about four times longer than that of as-deposited MoS2 film.
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影响因子：
3.2
作者：
A. Voevodin;J. O’Neill;J. Zabinski
通讯作者：
A. Voevodin;J. O’Neill;J. Zabinski
影响因子：
2.1
作者：
J. Zabinski;M. Donley;S. Walck;T. Schneider;N. T. McDevitt
通讯作者：
J. Zabinski;M. Donley;S. Walck;T. Schneider;N. T. McDevitt
影响因子：
1.9
作者：
L. Firment;A. Ferretti
通讯作者：
L. Firment;A. Ferretti
影响因子：
1.6
作者：
A. Tribble;R. Lukins;E. Watts;V. Borisov;S. Demidov;V. Denisenko;A. A. Gorodetski-A.;V. Grishin
通讯作者：
A. Tribble;R. Lukins;E. Watts;V. Borisov;S. Demidov;V. Denisenko;A. A. Gorodetski-A.;V. Grishin
影响因子：
3.2
作者：
Donnet, C;Erdemir, A
通讯作者：
Erdemir, A