Band Alignment of ScxAl1-xN/GaN Heterojunctions.
Band Alignment of ScxAl1-xN/GaN Heterojunctions.
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ScxAl1-xN/GaN 异质结的能带对准。
DOI:
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发表时间:
2020
影响因子:
9.5
通讯作者:
D. Meyer
中科院分区:
文献类型:
--
作者:
Eric N. Jin;M. Hardy;Alyssa L. Mock;J. L. Lyons;Alan R. Kramer;M. Tadjer;N. Nepal;D. Katzer;D. Meyer
ScAlN is an emergent ultrawide-band-gap material with both a high piezoresponse and demonstrated ferroelectric polarization switching. Recent demonstration of epitaxial growth of ScAlN on GaN has unlocked prospects for new high-power transistors and nonvolatile memory technologies fabricated from these materials. An understanding of the band alignments between ScAlN and GaN is crucial in order to control the electronic and optical properties of engineered devices. To date, there have been no experimental studies of the band offsets between ScAlN and GaN. This work presents optical characterization of the band gap of molecular beam epitaxy grown ScxAl1-xN using spectroscopic ellipsometry and measurements of the band offsets of ScxAl1-xN with GaN using X-ray photoemission spectroscopy, along with a comparison to first-principles calculations. The band gap is shown to continuously decrease as a function of increasing ScN alloy fraction with a negative bowing parameter. Furthermore, a crossover from straddling (type-I) to staggered (type-II) band offsets is demonstrated as Sc composition increases beyond approximately x = 0.11. These results show that the ScAlN/GaN valence band alignment can be tuned by changing the Sc alloy fraction, which can help guide the design of heterostructures in future ScAlN/GaN-based devices.
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影响因子:
4
作者:
Mock, Alyssa;Dugan, Christina;Knight, Sean;Korlacki, Rafał;Mann, J. Matthew;Kimani, Martin M.;Petrosky, James C.;Dowben, Peter A.;Schubert, Mathias
通讯作者:
Schubert, Mathias
影响因子:
3.2
作者:
Siyuan Zhang;D. Holec;W. Fu;C. Humphreys;M. Moram
通讯作者:
Siyuan Zhang;D. Holec;W. Fu;C. Humphreys;M. Moram
影响因子:
2.8
作者:
Leone, Stefano;Ligl, Jana;Ambacher, Oliver
通讯作者:
Ambacher, Oliver
影响因子:
4
作者:
Adamski, Nicholas L.;Dreyer, Cyrus E.;Van de Walle, Chris G.
通讯作者:
Van de Walle, Chris G.
影响因子:
3.2
作者:
Zhang, S.;Fu, W. Y.;Moram, M. A.
通讯作者:
Moram, M. A.