Band Alignment of ScxAl1-xN/GaN Heterojunctions.

Band Alignment of ScxAl1-xN/GaN Heterojunctions.
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ScxAl1-xN/GaN 异质结的能带对准。

DOI:
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发表时间:
2020
影响因子:
9.5
通讯作者:
D. Meyer
D. Meyer
中科院分区:
材料科学2区
文献类型:
--
作者:
Eric N. Jin;M. Hardy;Alyssa L. Mock;J. L. Lyons;Alan R. Kramer;M. Tadjer;N. Nepal;D. Katzer;D. Meyer

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ScAlN 是一种新兴的超宽带隙材料,具有高压电响应和铁电极化开关。最近在 GaN 上外延生长 ScAlN 的演示开启了由这些材料制造的新型高功率晶体管和非易失性存储器技术的前景。了解 ScAlN 和 GaN 之间的能带排列对于控制工程器件的电子和光学特性至关重要。迄今为止,还没有对 ScAlN 和 GaN 之间的能带偏移进行实验研究。这项工作提出了使用光谱椭圆光度法对分子束外延生长的 ScxAl1-xN 的带隙进行光学表征,并使用 X 射线光电子能谱测量 ScxAl1-xN 与 GaN 的带偏移,并与第一原理计算进行比较。结果表明,随着 ScN 合金分数的增加,带隙随着负弯曲参数的增加而不断减小。此外,当 Sc 成分增加超过约 x = 0.11 时,证明了从跨式(I 型)到交错式(II 型)能带偏移的交叉。这些结果表明,ScAlN/GaN 价带排列可以通过改变 Sc 合金含量来调节,这有助于指导未来基于 ScAlN/GaN 器件的异质结构设计。
ScAlN is an emergent ultrawide-band-gap material with both a high piezoresponse and demonstrated ferroelectric polarization switching. Recent demonstration of epitaxial growth of ScAlN on GaN has unlocked prospects for new high-power transistors and nonvolatile memory technologies fabricated from these materials. An understanding of the band alignments between ScAlN and GaN is crucial in order to control the electronic and optical properties of engineered devices. To date, there have been no experimental studies of the band offsets between ScAlN and GaN. This work presents optical characterization of the band gap of molecular beam epitaxy grown ScxAl1-xN using spectroscopic ellipsometry and measurements of the band offsets of ScxAl1-xN with GaN using X-ray photoemission spectroscopy, along with a comparison to first-principles calculations. The band gap is shown to continuously decrease as a function of increasing ScN alloy fraction with a negative bowing parameter. Furthermore, a crossover from straddling (type-I) to staggered (type-II) band offsets is demonstrated as Sc composition increases beyond approximately x = 0.11. These results show that the ScAlN/GaN valence band alignment can be tuned by changing the Sc alloy fraction, which can help guide the design of heterostructures in future ScAlN/GaN-based devices.
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