Anomalous optical surface absorption in nominally pure silicon samples at 1550 nm

Anomalous optical surface absorption in nominally pure silicon samples at 1550 nm
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标称纯硅样品在 1550 nm 处的反常光学表面吸收

DOI:
10.1088/1361-6382/aa8aac
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发表时间:
2017
影响因子:
3.5
通讯作者:
Bell A
Bell A
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Bell A

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2016年2月,LIGO和Virgo合作宣布直接探测到引力波(GW),消除了关于GW天文学可能性的任何不确定性。它已经证明,未来的探测器的灵敏度比先进的LIGO探测器高10倍,每年可以看到数千个事件。许多关于这种未来干涉式GW探测器的建议假设使用硅测试质量。硅在低温下具有较低的机械损耗,这使得悬置干涉仪镜面的位移噪声较低。除了低机械损耗外,还要求测试质量具有低光学损耗。在1550 nm处的测量表明,可以获得具有足够低体积吸收的材料;然而,有人认为这种低吸收材料的表面吸收率为100 PPM,这可能会妨碍其在未来低温探测器中的使用。我们在本文中表明,这种表面损失不是固有的,而是可能是特定抛光技术的结果,可以通过正确的抛光程序消除或避免。这是在硅基仪器中实现高引力波探测率的重要一步。
The announcement of the direct detection of gravitational waves (GW) by the LIGO and Virgo collaboration in February 2016 has removed any uncertainty around the possibility of GW astronomy. It has demonstrated that future detectors with sensitivities ten times greater than the Advanced LIGO detectors would see thousands of events per year. Many proposals for such future interferometric GW detectors assume the use of silicon test masses. Silicon has low mechanical loss at low temperatures, which leads to low displacement noise for a suspended interferometer mirror. In addition to the low mechanical loss, it is a requirement that the test masses have a low optical loss. Measurements at 1550 nm have indicated that material with a low enough bulk absorption is available; however there have been suggestions that this low absorption material has a surface absorption of> 100 ppm which could preclude its use in future cryogenic detectors. We show in this paper that this surface loss is not intrinsic but is likely to be a result of particular polishing techniques and can be removed or avoided by the correct polishing procedure. This is an important step towards high gravitational wave detection rates in silicon based instruments.
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