Brain-Inspired Computing for Circuit Reliability Characterization
Brain-Inspired Computing for Circuit Reliability Characterization
复制标题
用于电路可靠性表征的类脑计算
DOI:
10.1109/tc.2022.3151857
复制
发表时间:
2022
影响因子:
3.7
通讯作者:
H. Amrouch
中科院分区:
文献类型:
--
作者:
P. Genssler;H. Amrouch
Transistor scaling steadily approaches fundamental limits. Sustaining circuit reliability becomes an overwhelming challenge for foundries and their manufacturing processes. Therefore, early and rapid characterization of degradation effects impacting the circuits’ transistors becomes essential. Such degradation effects are caused by design-time variation due to manufacturing variability and/or run-time variation due to transistor aging. In this work, we are the first to employ brain-inspired HDC for circuit reliability. HDC is quickly emerging as an attractive light-weight machine-learning solution. Nowadays, it is mainly applied to bio-signal processing or language recognition. We bring the research of HDC to the next level by demonstrating how it can be applied to address the challenges in circuit reliability. This has far-reaching consequences due to the large savings achieved by 1) reducing the amount of training data and hence the development cycle, 2) removing the need to send the data to the cloud for model training, and 3) speeding up significantly the characterization and classification tasks due to the fast edge-inference. We demonstrate the viability of HDC using SRAM and other circuits as examples. HDC outperforms traditional machine learning methods, such as support vector machine or random forest, in accuracy and requires up to 20x fewer training samples. For a given budget of samples, HDC achieves a 4x smaller error. Our implementation and analysis are based on industrial <inline-formula><tex-math notation="LaTeX">$14 \;\mathrm{n}\mathrm{m}$</tex-math><alternatives><mml:math><mml:mrow><mml:mn>14</mml:mn><mml:mspace width="0.166667em"/><mml:mi mathvariant="normal">n</mml:mi><mml:mi mathvariant="normal">m</mml:mi></mml:mrow></mml:math><inline-graphic xlink:href="genssler-ieq1-3151857.gif"/></alternatives></inline-formula> FinFET fully calibrated with Intel measurements with respect to both transistor electrical characteristics as well as manufacturing variability. <italic>Open Source:</italic> Our framework including the algorithm implementation is available for the community to explore other algorithms and circuits at <uri>https://github.com/ML-CAD/HDC-Circuit-Reliability</uri>.
DOI:
--
发表时间:
2021-03
期刊:
ArXiv
影响因子:
--
作者:
T. Basaklar;Y. Tuncel;S. Y. Narayana;S. Gumussoy;U. Ogras
通讯作者:
T. Basaklar;Y. Tuncel;S. Y. Narayana;S. Gumussoy;U. Ogras
DOI:
10.23919/date51398.2021.9473920
发表时间:
2021
期刊:
and Testing in Europe (DATE
影响因子:
--
作者:
Khaleghi, B.
通讯作者:
Khaleghi, B.
DOI:
10.1109/tcad.2016.2620903
发表时间:
2017
影响因子:
2.9
作者:
A. Vijayan;A. Koneru;S. Kiamehr;K. Chakrabarty;M.B. Tahoori
通讯作者:
M.B. Tahoori