Enhanced efficiency of Cu(2)ZnSn(S,Se)(4) solar cells via anti-reflectance properties and surface passivation by atomic layer deposited aluminum oxide.
Enhanced efficiency of Cu(2)ZnSn(S,Se)(4) solar cells via anti-reflectance properties and surface passivation by atomic layer deposited aluminum oxide.
复制标题
通过原子层沉积氧化铝的抗反射特性和表面钝化提高 Cu2ZnSn(S,Se)(4) 太阳能电池的效率
DOI:
10.1039/c8ra03437k
复制
发表时间:
2018-05-22
期刊:
影响因子:
3.9
通讯作者:
Yao, Bin
中科院分区:
文献类型:
--
作者:
Zhang, Bingye;Han, Lu;Ying, Shitian;Li, Yongfeng;Yao, Bin
Reducing interface recombination losses is one of the major challenges in developing Cu2ZnSn(S,Se)4 (CZTSSe) solar cells. Here, we propose a CZTSSe solar cell with an atomic layer deposited Al2O3 thin film for surface passivation. The influence of passivation layer thickness on the power conversion efficiency (PCE), short-circuit current density (Jsc), open-circuit voltage (Voc) and fill factor (FF) of the solar cell is systematically investigated. It is found that the Al2O3 film presents notable antireflection (AR) properties over a broad range of wavelengths (350–1000 nm) for CZTSSe solar cells. With increasing Al2O3 thickness (1–10 nm), the average reflectance of the CZTSSe film decreases from 12.9% to 9.6%, compared with the average reflectance of 13.6% for the CZTSSe film without Al2O3. The Al2O3 passivation layer also contributes to suppressed surface recombination and enhanced carrier separation. Passivation performance is related to chemical and field effect passivation, which is due to released H atoms from the Al–OH bonds and the formation of Al vacancies and O interstitials within Al2O3 films. Therefore, the Jsc and Voc of the CZTSSe solar cell with 2 nm-Al2O3 were increased by 37.8% and 57.8%, respectively, in comparison with those of the unpassivated sample. An optimal CZTSSe solar cell was obtained with a Voc, Jsc and η of 0.361 V, 33.78 mA and 5.66%. Our results indicate that Al2O3 films show the dual functions of AR and surface passivation for photovoltaic applications. ALD-Al2O3 is used as a passivation layer in a CZTSSe device and optimal device parameters are obtained by precisely controlling Al2O3 thickness.
登录
查看更多内容
影响因子:
2.1
作者:
Herz, K;Eicke, A;Powalla, M
通讯作者:
Powalla, M
影响因子:
4
作者:
Hsu, W. -W.;Chen, J. Y.;Liu, C. W.
通讯作者:
Liu, C. W.
影响因子:
9.5
作者:
Jeong, Ho-Jung;Kim, Ye-Chan;Jang, Jae-Hyung
通讯作者:
Jang, Jae-Hyung
影响因子:
--
作者:
Shin, Seung Wook;Han, Jun Hee;Kim, Jin Hyeok
通讯作者:
Kim, Jin Hyeok
影响因子:
6.9
作者:
Sozzi, Giovanna;Di Napoli, Simone;Tiwari, Ayodhya N.
通讯作者:
Tiwari, Ayodhya N.