Line-Field Swept-Source Interferometer for Simultaneous Measurement of Thickness and Refractive Index Distribution
Line-Field Swept-Source Interferometer for Simultaneous Measurement of Thickness and Refractive Index Distribution
复制标题
用于同时测量厚度和折射率分布的线场扫描源干涉仪
DOI：
10.1109/jlt.2016.2605300
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发表时间：
2017
影响因子：
4.7
通讯作者：
Chang
中科院分区：
文献类型：
--
作者：
Soon;G. Kim;M. Kim;B. Shin;Chang
我们提出了一种用线场扫描源干涉仪同时测量透明试样厚度和折射率分布的新方法。本研究采用一种新型的800 nm中心扫光源和基于硅的1024像素电荷耦合器件（CCD）探测器组合，采用线场光束代替点聚焦光束照射，同时测量沿线场分布的多重干扰。当透明试样厚度不均匀或折射率不均匀时，也可以通过一步比较过程同时测量这两个参数在被照区域的整体分布。采用4种透明样品，采用36 hz扫频光源和36 khz线率CCD探测器，在27 ms的单波长扫描时间内，精确测量了每个样品和一组样品与两个样品配对的厚度和折射率分布。
We present a novel method for simultaneous measurement of the thickness and refractive index distribution of a transparent specimen by a line-field swept-source interferometer. In this study, by illuminating with the line-field beam instead of the point-focused beam, multiple interferences along the line-field distribution are measured simultaneously by using a combination of a novel swept source of 800-nm central region and a Si-based 1024-pixel charge-coupled device (CCD) detector. When the transparent specimen has an uneven thickness or nonuniform refractive index, the whole distribution of these two parameters can be also simultaneously measured over the illuminated region with a one-step comparison process. Using four types of transparent specimens, the thickness and refractive index distribution of each sample and a group sample paired with two specimens are accurately measured during the single wavelength scanning time of 27 ms by using the swept source with a 36-Hz sweeping rate and the CCD detector with a 36-kHz line rate.
使用光纤布拉格光栅的谱域光学相干断层扫描的校准和表征协议。
影响因子：
3.5
作者：
Eom,TaeJoong;Ahn,Yeh-Chan;Kim,Chang-Seok;Chen,Zhongping
通讯作者：
Chen,Zhongping