Film and Interface Atomic Structures of Electrodeposited Co/Au(111) Layers: An in Situ X-ray Scattering Study as a Function of the Surface Chemistry and the Electrochemical Potential

Film and Interface Atomic Structures of Electrodeposited Co/Au(111) Layers: An in Situ X-ray Scattering Study as a Function of the Surface Chemistry and the Electrochemical Potential
复制标题

电沉积 Co/Au(111) 层的薄膜和界面原子结构:原位 X 射线散射研究作为表面化学和电化学势的函数

DOI:
10.1021/acs.jpcc.5b11107
复制
发表时间:
2016
期刊:
The Journal of Physical Chemistry C
影响因子:
--
通讯作者:
Lucas C
Lucas C
中科院分区:
--
文献类型:
--
作者:
Lucas C

文献摘要

参考文献

被引文献

相似文献

利用原位表面x射线衍射(SXRD)和扫描隧道显微镜(STM)研究了电沉积在Au(111)上的Co薄膜的生长和原子结构。用SXRD实时监测Co沉积后的生长情况,并将Co薄膜的应变表征为Co厚度的函数。面内SXRD测量表明,Co沉积导致在Au - Co界面处形成重建的Au层,该层由相对于底层大块Au晶格均匀压缩的无缺陷的单一Au单层组成。采用扩展x射线反射率(或镜面晶体截断棒(CTR))测量名义上两层单层厚度(2ml)的Co沉积,研究了Au-Co界面和Co膜的表面法向结构。原位STM也被用来获得Co膜的形态和Au(111)在Co溶解前后的重建模式。STM数据为SXRD结果提供了补充信息。在2 ~ 3ml厚的Co膜上,详细研究了Co结构对Co吸附一氧化碳的影响。结果表明,CO吸附在CO层中引起了微小的垂直弛豫。相反,改变电化学电位对Co结构的影响可以忽略不计,只影响电化学双层中电解质的分层。讨论了实验结果与Co薄膜磁性能的关系。
The growth and atomic structure of thin Co films electrodeposited onto Au(111) have been studied using in situ surface X-ray diffraction (SXRD) and scanning tunneling microscopy (STM). SXRD is used to monitor the growth in real-time and, following Co deposition, the strain of the Co film is characterized as a function of the Co thickness. In-plane SXRD measurements show that Co deposition leads to the formation of a reconstructed Au layer at the Au–Co interface that is composed of an unfaulted, single Au monolayer uniformly compressed with respect to the underlying bulk Au lattice. The surface normal structure of the Au–Co interface and Co films are examined by measurement of the extended X-ray reflectivity (or specular crystal truncation rod (CTR)) for a nominally two monolayer thick (2 ML) Co deposit. In situ STM has also been used to obtain the morphology of the Co films and the Au(111) reconstruction pattern both before and after Co dissolution. The STM data give complementary information to the SXRD results. The influence on the Co structure of the adsorption of carbon monoxide is also investigated in detail for a 2–3 ML thick Co film. It is shown that CO adsorption induces small vertical relaxations in the Co layers. In contrast, varying the electrochemical potential has negligible influence on the Co structure and affects only the electrolyte layering in the electrochemical double layer. The results are discussed in relation to the magnetic properties of the Co films.
DOI: 10.1021/jp301709z
发表时间: 2012-05-24
影响因子: 3.7
作者:
Keller, Hubert;Saracino, Martino;Broekmann, Peter
通讯作者: Broekmann, Peter
超薄 Au/Co/Au 薄膜的磁性与结构的相关性:磁致弹性效应的证据
DOI: --
发表时间: 2009
期刊:
影响因子: --
作者:
M. Sakamaki;T. Konishi;T. Fujikawa;A. Persson;C. Andersson;O. Karis;D. Arvanitis;H. Rossner;E. Holub
通讯作者: E. Holub
DOI: 10.1002/chin.201236206
发表时间: 2010
期刊: MRS Bulletin
影响因子: 5
作者:
P. Allongue;F. Maroun
通讯作者: F. Maroun
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者:
Cristina Vaz;A. Aranzabal;Á. Cuesta
通讯作者: Á. Cuesta
Au(100) 上同质外延电化学生长的原位表面 X 射线衍射研究。
DOI: 10.1103/physrevlett.96.246101
发表时间: 2006
影响因子: 8.6
作者:
K. Krug;J. Stettner;Olaf M. Magnussen
通讯作者: Olaf M. Magnussen