Continuous Deposition of a Liquid Thread onto a Moving Substrate. Numerical Analysis and Comparison With Experiments

Continuous Deposition of a Liquid Thread onto a Moving Substrate. Numerical Analysis and Comparison With Experiments
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将液体线连续沉积到移动的基材上。

DOI:
10.1115/1.4005668
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发表时间:
2012
期刊:
Journal of Fluids Engineering
影响因子:
--
通讯作者:
Ubal S
Ubal S
中科院分区:
--
文献类型:
--
作者:
Ubal S

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对在移动的平面固体基底上打印液体细线的过程进行了数值研究。对于固定值的毛细管数,稳态沉积的窗口,探讨在基板喷嘴的间隙和流速参数空间的两个喷嘴配置:一个喷嘴垂直指向板和一个喷嘴稍微倾斜的基板运动方向。发现了流速的下限,低于该下限不能获得稳态解。该最小流速随着喷嘴间距和喷嘴倾斜度的增加而增加。在流速扰动下,该较低流速边界附近的解是稳定的。该过程也进行了实验研究,并与相应的数值模拟的测量进行了比较,给出了一个相当好的协议,除了在前进的前沉积区域。
The printing of a thin line of liquid onto a moving flat solid substrate was studied numerically. For a fixed value of the Capillary number, the window of steady state deposition was explored in terms of the substrate-nozzle gap and flow rate parameter space for two nozzle configurations: a nozzle pointing vertically at the plate and a nozzle slightly tilted towards the substrate motion direction. A lower limit for the flow rate was found, below which no steady state solutions could be obtained. This minimum flow rate increases as the nozzle stand-off and the nozzle tilting do. Solutions near this lower flow rate boundary were stable under a flow rate perturbation. The process was also studied experimentally and the measurements were compared with the corresponding numerical simulations, giving a fairly good agreement, except in the advancing front deposition region.
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