Removal of sulfamethoxazole, sulfathiazole and sulfamethazine in their mixed solution by UV/H2O2 process
Removal of sulfamethoxazole, sulfathiazole and sulfamethazine in their mixed solution by UV/H2O2 process
复制标题
UV/H2O2工艺去除混合溶液中的磺胺甲恶唑、磺胺噻唑和磺胺二甲嗪
DOI：
10.3390/ijerph16101797
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发表时间：
2019-05
影响因子：
--
通讯作者：
Xue Qi
中科院分区：
文献类型：
--
作者：
Zhu Guangcan;Sun Qi;Wang Chuya;Yang Zhonglian;Xue Qi
磺胺甲恶唑（SMZ）、磺胺噻唑（STZ）和磺胺二甲嗪（SMT）是典型的磺胺类药物，广泛存在于水环境中，近年来引起了人们的高度关注。在本研究中，创新性地研究了使用UV/H2O2工艺对SMZ、STZ和SMT在其混合溶液中的光化学氧化。结果表明，磺胺类药物在UV/H2O2体系中能够完全分解，共存体系中各污染物均符合准一级动力学模型。磺胺类药物的去除效果受混合溶液初始浓度、紫外光照射强度、H2O2用量和溶液初始pH值的影响。紫外光强度和H2O2用量的增加显着提高了分解效率，而较高的混合溶液初始浓度严重抑制了分解速率。 SMZ和SMT在UV/H2O2过程中的分解在中性和酸性条件下是有利的。此外，深入鉴定了UV/H2O2过程中生成的SMZ、STZ和SMT中间体，并提出了相应的降解途径。
Sulfamethoxazole (SMZ), sulfathiazole (STZ) and sulfamethazine (SMT) are typical sulfonamides, which are widespread in aqueous environments and have aroused great concern in recent years. In this study, the photochemical oxidation of SMZ, STZ and SMT in their mixed solution using UV/H2O2 process was innovatively investigated. The result showed that the sulfonamides could be completely decomposed in the UV/H2O2 system, and each contaminant in the co-existence system fitted the pseudo-first-order kinetic model. The removal of sulfonamides was influenced by the initial concentration of the mixed solution, the intensity of UV light irradiation, the dosage of H2O2 and the initial pH of the solution. The increase of UV light intensity and H2O2 dosage.substantially enhanced the decomposition eciency, while a higher initial concentration of mixed solution heavily suppressed the decomposition rate. The decomposition of SMZ and SMT during the UV/H2O2 process was favorable under neutral and acidic conditions. Moreover, the generated intermediates of SMZ, STZ and SMT during the UV/H2O2 process were identified in depth, and a corresponding degradation pathway was proposed.
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影响因子：
11.4
作者：
V. Pereira;H. Weinberg;K. Linden;P. Singer
通讯作者：
V. Pereira;H. Weinberg;K. Linden;P. Singer
影响因子：
8.7
作者：
Vanessa Ribeiro Urbano;Marcela Souza Peres;M. Maniero;J. R. Guimarães
通讯作者：
Vanessa Ribeiro Urbano;Marcela Souza Peres;M. Maniero;J. R. Guimarães
影响因子：
1.1
作者：
Wanqian Guo;Renli Yin;Xian-Jiao Zhou;H. Cao;Jo‐Shu Chang;N. Ren
通讯作者：
Wanqian Guo;Renli Yin;Xian-Jiao Zhou;H. Cao;Jo‐Shu Chang;N. Ren
影响因子：
13.6
作者：
Fabianska, Aleksandra;Bialk-Bielinska, Anna;Siedlecka, Ewa Maria
通讯作者：
Siedlecka, Ewa Maria
影响因子：
13.6
作者：
Hu, Qinhai;Zhang, Chunlong;Zhu, Miaojun
通讯作者：
Zhu, Miaojun