Electrochemical characterization of cast Ti-Hf binary alloys.
Electrochemical characterization of cast Ti-Hf binary alloys.
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铸造 Ti-Hf 二元合金的电化学表征。
DOI:
10.1016/j.actbio.2005.02.006
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发表时间:
2005
期刊:
影响因子:
--
通讯作者:
Okabe,T
中科院分区:
文献类型:
--
作者:
Cai,Z;Koike,M;Sato,H;Brezner,M;Guo,Q;Komatsu,M;Okuno,O;Okabe,T
This study characterized the electrochemical behavior of Ti–Hf binary alloys in a simulated oral environment. Ti–Hf alloys (10, 20, 25, 30, 35 and 40 mass% Hf) were prepared by arc-melting titanium sponge and hafnium sponge. Specimens of each alloy (n=4) were prepared using a dental titanium casting system with a MgO-based investment. Specimens were inspected with X-ray radiography to ensure minimal internal porosity. Castings (n=4) made from pure titanium and commercially pure titanium were used as controls. The ground flat surface (10mm×10mm) on each specimen where approximately 30μm was removed was used for the characterization. Sixteen-hour open-circuit potential (OCP) measurement, linear polarization and potentiodynamic cathodic polarization were performed sequentially in aerated (air+10% CO2) MTZ synthetic saliva at 37°C. Potentiodynamic anodic polarization was conducted in the same medium but deaerated (N2+10% CO2) 2h before and during testing. Polarization resistance (RP) and Tafel slopes were determined, as were corrosion current density (ICORR) and passive current density (IPASS). Results were subjected to nonparametric statistical analysis (α=0.05). The OCP stabilized (mean values −229mV to −470mV vs. SCE) for all specimens after the 16-h immersion. Similar passivation was observed for all the metals on their anodic polarization diagrams. The Kruskal–Wallis test showed significant differences in OCP among the test groups (p=0.006). No significant differences were found in RP, ICORRor IPASSamong all the metals (p>0.3). Results indicate that the electrochemical behavior of the Ti–Hf alloys examined resembles that of pure titanium.
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影响因子:
14
作者:
Zhuo Cai;Hiroshi Nakajima;M. Woldu;Anders Berglund;Maud Bergman;Toru Okabe
通讯作者:
Zhuo Cai;Hiroshi Nakajima;M. Woldu;Anders Berglund;Maud Bergman;Toru Okabe
影响因子:
3.4
作者:
D. Taylor;M. Lehmann;F. Planas;A. Seidel
通讯作者:
A. Seidel
影响因子:
14
作者:
M. Koike;Z. Cai;H. Fujii;M. Brezner;T. Okabe
通讯作者:
M. Koike;Z. Cai;H. Fujii;M. Brezner;T. Okabe
影响因子:
14
作者:
Cai, Z;Shafer, T;Okabe, T
通讯作者:
Okabe, T
DOI:
--
发表时间:
1955
期刊:
影响因子:
--
作者:
Carver;E. Hayes
通讯作者:
E. Hayes