Epitaxial growth of atomically flat KBr(111) films via a thin film ionic liquid in a vacuum

Epitaxial growth of atomically flat KBr(111) films via a thin film ionic liquid in a vacuum
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真空中通过薄膜离子液体外延生长原子级平坦的 KBr(111) 薄膜

DOI:
10.1039/c6ce00620e
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发表时间:
2016
期刊:
影响因子:
3.1
通讯作者:
K. Toyabe and Y. Matsumoto
K. Toyabe and Y. Matsumoto
中科院分区:
化学3区
文献类型:
--
作者:
M. Yamauchi;S. Maruyama;N. Ohashi;K. Toyabe and Y. Matsumoto

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nacl型晶体(111)的极性面在静电作用下是如此不稳定,以致其原子平面(111)表面迄今难以获得。在这项工作中,基于我们在α-Al2O3(0001)衬底上通过离子液滴真空沉积生长的扁平KBr(111)微晶体的初步结果,我们已经实现了在α-Al2O3(0001)衬底上生长的原子扁平外延KBr(111)薄膜。这一成功的关键在于,通过引入非晶状“润湿层”,离子液体在衬底上的润湿性得到了极大的改善。此外,通过光学显微镜的远程聚焦镜头原位生长监测,揭示了离子液体中的生长过程:随机成核直接发生在衬底上,而不是离子液体中,随后,成核的KBr岛在面内方向上生长得更快,而不是在面外方向上相互结合,在衬底上形成连续的KBr膜。通过透射电镜观察,提出了横向过度生长机制来解释KBr(111)薄膜在非晶状润湿层/α-Al2O3(0001)衬底上的外延生长。
The NaCl-type crystal (111) polar face is electrostatically so unstable that its atomically flat (111) surface has been difficult to obtain so far. In this work, based on our preliminary results on flat KBr(111) microcrystals on an α-Al2O3(0001) substrate grown via ionic liquid droplets by vacuum deposition, we have achieved atomically flat, epitaxial KBr(111) films grown all over an α-Al2O3(0001) substrate. The key point to this success is the great improvement in the wettability of the ionic liquid on the substrate by introducing an amorphous-like “wetting layer”. Furthermore, in situ growth monitoring by means of an optical microscope with a long-distance focus lens reveals the growth process in the ionic liquid: random nucleation occurs directly on the substrate, but not in the ionic liquid, and subsequently, the nucleated KBr islands grow more rapidly in the in-plane direction rather than in the out-of-plane direction to coalesce with each other, forming a continuous KBr film over the substrate. The lateral overgrowth mechanism is proposed to explain the epitaxial growth of KBr(111) films even on the amorphous-like wetting layer/α-Al2O3(0001) substrate on the basis of a cross-sectional TEM observation.
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