Microstructure characterization of oxidation of aluminized coating prepared by a combined process

Microstructure characterization of oxidation of aluminized coating prepared by a combined process
复制标题

复合工艺镀铝层氧化微观结构表征

DOI:
10.1016/j.jnucmat.2008.05.012
复制
发表时间:
2008-08
影响因子:
3.1
通讯作者:
H.B. Liu
H.B. Liu
中科院分区:
工程技术2区
文献类型:
--
作者:
J. Tao;Z. Xu;J. Xu;X.J. Sun;Z.F. Chen;H.B. Liu

文献摘要

参考文献

被引文献

相似文献

氧化铝层是氚渗透阻挡层的一个很好的候选者,该阻挡层对于控制高温气冷反应堆和聚变反应堆中使用的结构材料的氚渗透损失具有重要意义。本文研究了采用双层辉光等离子体渗铝氧化复合工艺在316L不锈钢表面形成的氚渗透屏障氧化膜的组织结构。采用扫描电子显微镜(SEM)、X射线衍射仪(XRD)和透射电子显微镜(TEM)对涂层的微观结构和相结构进行了分析。用X射线光电子能谱(XPS)分析了氧化膜中Al、O元素的化学组成和化学状态。渗铝后,涂层的典型组织主要由外层高铝金属间化合物层(Fe2Al5和FeAl)和中间铁素体不锈钢层(αFe(Al))组成,其次是奥氏体层。经复合处理后,渗铝层表面成功地形成了由Al_2O_3和尖晶石FeAl_2O_4组成的氧化层,外层为非晶态,底层为纳米晶结构。
Alumina layer is a good candidate for the tritium penetration barrier that is important in the control of tritium losses due to permeation through structural materials used in high-temperature gas-cooled reactors and in fusion reactors. This paper describes the microstructure of the oxide film of the tritium penetration barrier formed on 316L stainless steel, which was prepared by a combined process, namely, aluminizing and oxidizing treatments using a double glow plasma technology. Microstructure and phase structure of the coatings investigated were examined by scanning electronic microscope (SEM), X-ray diffraction analysis (XRD) and transmission electron microscopy (TEM), respectively. The chemical composition and the chemical states of Al, O elements in the oxidation film were identified by X-ray photoelectron spectroscopy (XPS). After aluminization, the typical microstructure of the coating mainly consisted of an outer high aluminum-containing intermetallic compound layer (Fe2Al5and FeAl) and intermediate ferritic stainless steel (α Fe(Al))layer followed by the austenitic substrate. After the combined process, an oxide layer that consisted of Al2O3and spinel FeAl2O4had been successfully formed on the aluminizing coating surface, with an amorphous outmost surface and an underlying subsurface nanocrystalline structure.
DOI: 10.1016/j.jnucmat.2004.04.205
发表时间: 2004-08
影响因子: 3.1
作者:
A. Aiello;A. Ciampichetti;G. Benamati
通讯作者: A. Aiello;A. Ciampichetti;G. Benamati
DOI: 10.1016/j.surfcoat.2007.06.034
发表时间: 2007-12
影响因子: 5.4
作者:
Zhong Xu;Wenhui Zhu;Jie Tao;Zheyuan Chen;Shuyun Jiang;Jiang Xu
通讯作者: Jiang Xu
DOI: 10.1016/j.apsusc.2004.04.014
发表时间: 2004-09
影响因子: 6.7
作者:
S. Rana;S. Ram;S. Seal;S. Roy
通讯作者: S. Rana;S. Ram;S. Seal;S. Roy
DOI: 10.1016/j.vacuum.2003.11.001
发表时间: 2004-01
期刊: Vacuum
影响因子: 4
作者:
Xuan Jiang;Xu Zhang;Xi-shan Xie;Zhong Xu;Wenjin Liu
通讯作者: Xuan Jiang;Xu Zhang;Xi-shan Xie;Zhong Xu;Wenjin Liu
DOI: 10.1016/s0257-8972(99)00616-7
发表时间: 2000-03
影响因子: 5.4
作者:
L. Dumitrescu;F. Maury
通讯作者: L. Dumitrescu;F. Maury