Preparation of Ni–Cu–Mo–Cr film deposited on AZ31magnesium alloy by double glow sputtering with Cu interlayer
Preparation of Ni–Cu–Mo–Cr film deposited on AZ31magnesium alloy by double glow sputtering with Cu interlayer
复制标题
AZ31镁合金上Cu夹层双辉溅射Ni-Cu-Mo-Cr薄膜的制备
DOI：
10.1016/j.surfcoat.2007.06.034
复制
发表时间：
2007-12
影响因子：
5.4
通讯作者：
Jiang Xu
中科院分区：
文献类型：
--
作者：
Zhong Xu;Wenhui Zhu;Jie Tao;Zheyuan Chen;Shuyun Jiang;Jiang Xu
为提高AZ31镁合金的耐蚀性能，采用双层辉光溅射沉积Ni-Cu-Mo-Cr电刷镀铜中间层的方法，在AZ31镁合金表面沉积了金属非晶/纳米晶薄膜。使用电刷镀铜中间层时，镍、铬、钼等贵金属元素的含量高于没有电刷镀铜中间层的镍基薄膜。电刷镀铜中间层的Ni-Cu-Mo-Cr合金薄膜的微观结构表明，薄膜分为两个区域，即最外表面的非晶层和晶粒尺寸小于5 nm的纳米晶层。用电化学极化方法研究了AZ31镁合金表面形成的镍基合金非晶膜。与AZ31镁合金相比，溅射沉积的镍基合金膜和在AZ31镁合金表面形成电刷镀铜中间层的溅射沉积镍基合金膜具有明显的钝化现象。
For improving the corrosion resistance of AZ31magnesium alloy, a double glow sputtering deposited Ni–Cu–Mo–Cr film with brush plating Cu interlayer is applied to deposit a metal amorphous/nanocrystal film on AZ31magnesium alloy. Using a brush plated Cu interlayer, the content of noble elements, such as Ni, Cr, and Mo, is higher than that of a Ni-based film without Cu interlayer. The microstructure of the Ni–Cu–Mo–Cr alloy film with the brush plated Cu interlayer confirms that the film is classified into two regions, i.e., an amorphous layer on the outmost surface and an underlying nanocrystalline layer with a grain size of less than 5 nm. The Ni-based alloy amorphous film formed on AZ31magnesium alloy was investigated using an electrochemical polarization measurement. Compared with the AZ31 magnesium alloy, the sputter-deposited Ni-based alloy film and the sputter-depostion Ni-based alloy film with a brush plated Cu interlayer formed on AZ31 magnesium alloy exhibit obvious passivation phenomena.
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影响因子：
4
作者：
Xuan Jiang;Xu Zhang;Xi-shan Xie;Zhong Xu;Wenjin Liu
通讯作者：
Xuan Jiang;Xu Zhang;Xi-shan Xie;Zhong Xu;Wenjin Liu
影响因子：
4
作者：
HUNG, LS;NASTASI, M;MAYER, JW
通讯作者：
MAYER, JW
影响因子：
5.4
作者：
J. Musil;A. Bell;M. Čepera;J. Zeman
通讯作者：
J. Musil;A. Bell;M. Čepera;J. Zeman
DOI：
10.1002/1521-396x(199703)160:1
发表时间：
1997-03
期刊：
Physica Status Solidi (a)
影响因子：
--
作者：
I. Golovin;M. Blanter;R. Schaller
通讯作者：
I. Golovin;M. Blanter;R. Schaller
影响因子：
5.4
作者：
Reiners, G;Griepentrog, M
通讯作者：
Griepentrog, M