Large-area epitaxial growth of MoSe2 via an incandescent molybdenum source
Large-area epitaxial growth of MoSe2 via an incandescent molybdenum source
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通过白炽钼源大面积外延生长 MoSe2
DOI:
10.1088/1361-6528/aa8b81
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发表时间:
2015-09
期刊:
影响因子:
3.5
通讯作者:
Iam Keong Sou
中科院分区:
文献类型:
--
作者:
Man Kit Cheng;Jing Liang;Ying Hoi Lai;Liang Xi Pang;Yi Liu;Jun Ying Shen;Jian Qiang Hou;Qing Lin He;Bo Chao Xu;Jun Shu Chen;Gan Wang;Chang Liu;Rolf Lortz;Iam Keong Sou
We have developed an incandescent Mo source to fabricate large-area single-crystalline MoSe2 thin films. The as-grown MoSe2 thin films were characterized using transmission electron microscopy, energy dispersive x-ray spectroscopy, atomic force microscopy, Raman spectroscopy, photoluminescence (PL), reflection high energy electron diffraction (RHEED) and angular resolved photoemission spectroscopy (ARPES). A new Raman characteristic peak at 1591 cm−1 was identified. Results from Raman spectroscopy, PL, RHEED and ARPES studies consistently reveal that large-area single crystalline mono-layer of MoSe2 could be achieved by this technique. This technique enjoys several advantages over conventional approaches and could be extended to the growth of other two-dimensional layered materials containing a low-vapor-pressure element.
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影响因子:
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