Investigation of Plasmonic Nanodot Arrays Compared with Nanohole Arrays Fabricated by a Sequential Nanoimprint Technique
Investigation of Plasmonic Nanodot Arrays Compared with Nanohole Arrays Fabricated by a Sequential Nanoimprint Technique
复制标题
等离子纳米点阵列与顺序纳米压印技术制造的纳米孔阵列的比较研究
DOI:
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发表时间:
2010
期刊:
影响因子:
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通讯作者:
Osamu Niwa
中科院分区:
文献类型:
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作者:
Kohei Nakamoto;Ryoji Kurita;Osamu Niwa
影响因子:
1.6
作者:
Nakamoto, Kohei;Kurita, Ryoji;Niwa, Osamu
通讯作者:
Niwa, Osamu