Ceramic Roller Inline Diffusion With Lowest Standard Deviation for Crystalline Si Solar Cells
Ceramic Roller Inline Diffusion With Lowest Standard Deviation for Crystalline Si Solar Cells
复制标题
适用于晶体硅太阳能电池的具有最低标准偏差的陶瓷辊在线扩散
DOI：
10.1109/jphotov.2019.2922368
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发表时间：
2019-06
影响因子：
3
通讯作者：
Xu Ying
中科院分区：
文献类型：
--
作者：
Huang Zhiping;Hu Wentao;Zhang Dong;Li Xiaowei;Chen Jingwei;Chen Jianhui;Yuan Xiangdong;He Ren;Wei Deyuan;Xu Ying
Crystalline silicon solar cells and modules have dominated terrestrial photovoltaic market. Inline diffusion as an alternative emitter fabrication method has been focused on due to its lower budget cost and higher throughput. In this study, phosphorus emitter with less metallic contamination was realized by means of ceramic roller inline diffusion (CRID) and diluted H3PO4 solution (5%) as a dopant source. A wide range of homogeneous sheet resistance (Rsq) (40–130 Ω/sq) was obtained at temperature increases from 810 to 870 °C with duration fixed on 20 min. A standard deviation (SD) of 2.1 Ω/sq was gained by CRID at the target Rsq of 75 Ω/sq compared with the SD of 4.0 Ω/sq by reference tube diffusion (TD). The Rsq can be adjusted from 71.1 to 115.6 Ω/sq by a removal of predefined “dead layer” in 1% KOH solution, which allows SD within a range of 2.1 to 5.2 Ω/sq. For a target Rsq of 85 Ω/sq, cells with efficiency SD of 0.02% were achieved by CRID, which were reduced by 76.8% relative to that by TD. The results in combination with Suns-Voc measurement indicate that CRID cells with uniform emitters have high potential for efficiency enhancement based on our investigation, which are catering for higher cell performance with multibusbar design in the near future.
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DOI：
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发表时间：
2005-06
期刊：
--
影响因子：
--
作者：
A. Ebong;V. Yelundur;V. Upadhyaya;B. Rounsaville;A. Upadhyaya;K. Tate;A. Rohatgi;J. Kalejs
通讯作者：
A. Ebong;V. Yelundur;V. Upadhyaya;B. Rounsaville;A. Upadhyaya;K. Tate;A. Rohatgi;J. Kalejs
DOI：
10.1109/pvsc.2010.5614375
发表时间：
2010-06
期刊：
2010 35th IEEE Photovoltaic Specialists Conference
影响因子：
--
作者：
P. J. Richter;F. Bottari;D. C. Wong
通讯作者：
P. J. Richter;F. Bottari;D. C. Wong
影响因子：
6.9
作者：
P. Basu;Z. Hameiri;D. Sarangi;J. Cunnusamy;E. Carmona;M. Boreland
通讯作者：
P. Basu;Z. Hameiri;D. Sarangi;J. Cunnusamy;E. Carmona;M. Boreland
影响因子：
4.6
作者：
L. Elbrecht;R. Catanescu;J. Zacheja;J. Binder
通讯作者：
L. Elbrecht;R. Catanescu;J. Zacheja;J. Binder
影响因子：
6.7
作者：
M. Zanuccoli;P. Magnone;E. Sangiorgi;C. Fiegna
通讯作者：
M. Zanuccoli;P. Magnone;E. Sangiorgi;C. Fiegna