Regulating Graphitic Carbon Nitride/Cocatalyst by an Amorphous MoS2 Conformal Multifunctional Intermediate Layer for Photocatalytic Hydrogen Evolution
Regulating Graphitic Carbon Nitride/Cocatalyst by an Amorphous MoS2 Conformal Multifunctional Intermediate Layer for Photocatalytic Hydrogen Evolution
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通过非晶态 MoS2 共形多功能中间层调节石墨氮化碳/助催化剂用于光催化析氢
DOI:
10.1021/acsaem.1c02872
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发表时间:
2021-11
影响因子:
6.4
通讯作者:
Rudolf Holze
中科院分区:
文献类型:
--
作者:
Jing Wang;Yulei Fan;Runhui Pan;Qi Hao;Yuping Wu;Teunis van Ree;Rudolf Holze
Cocatalyst engineering and interface engineering are two highly accredited strategies for improving photocatalytic activity. However, the combination of these two strategies is still challenging due to the difficulties in selecting suitable cocatalysts and consciously constructing photocatalyst/cocatalyst interfaces. The design of an intermediate layer in a photocatalyst/cocatalyst is possible for regulating the combination of these two strategies. Here, we report the synthesis of a CN/A-MoS2/Pt photocatalyst using amorphous MoS2(A-MoS2) as the conformal multifunctional intermediate layer between graphitic carbon nitride (CN) and Pt by in situ photodeposition. CN/A-MoS2/Pt has major synthetic merits of a conformal chemically bonded interface and low overpotential for the hydrogen evolution reaction by improving interface charge transfer and photochemical reaction kinetics. Impressively, when compared to CN, it exhibits a more than 83-fold visible-light-driven hydrogen evolution rate. This work demonstrates the great potential of photocatalysts regulated by a cocatalyst and interface engineering for solar-to-fuel conversion.
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影响因子:
9.9
作者:
Jiwei Sun;Shaorui Yang;Zhangqian Liang;Xiang Liu;Pengyuan Qiu;Hongzhi Cui;Jian Tian
通讯作者:
Jian Tian
影响因子:
16.6
作者:
Wang D;Gong XQ
通讯作者:
Gong XQ
影响因子:
13.3
作者:
Xiaowei Shi;M. Fujitsuka;Sooyeon Kim;T. Majima
通讯作者:
Xiaowei Shi;M. Fujitsuka;Sooyeon Kim;T. Majima
影响因子:
29.4
作者:
Xu, Yangsen;Fan, Mingjian;He, Qianjun
通讯作者:
He, Qianjun
DOI:
10.1021/acs.langmuir.9b01796
发表时间:
2019-08
期刊:
Langmuir : the ACS journal of surfaces and colloids
影响因子:
--
作者:
Jianhai Wang;Qing Zhou;Yanfei Shen;Xinghua Chen;Songqin Liu;Yuanjian Zhang
通讯作者:
Jianhai Wang;Qing Zhou;Yanfei Shen;Xinghua Chen;Songqin Liu;Yuanjian Zhang