Enhanced parametric pulse amplification in a comparable-mass plasma affected by charge state
Enhanced parametric pulse amplification in a comparable-mass plasma affected by charge state
复制标题
受电荷状态影响的同等质量等离子体中的增强参数脉冲放大
DOI:
10.1088/1361-6587/ab98df
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发表时间:
2020-06
影响因子:
2.2
通讯作者:
Xiao C. Z.
中科院分区:
文献类型:
--
作者:
Chen Y.;Zheng C. Y.;Liu Z. J.;Cao L. H.;Feng Q. S.;Xiao C. Z.
Enhanced stimulated Brillouin scattering and stimulated Raman scattering are shown in comparable-mass plasma by considering charge state through a simplified theoretical model and particle-in-cell simulations. We present a more general dispersion relation of plasma wave with arbitrary mass ratio (β=me/mi) and charge state (Z=Zi,Ze=1) compared to the previous electron–positron plasma study. Further, the ion-bulk mode is responsible for Brillouin amplification from kinetic analysis. Higher intensities of seed laser pulse amplification through stimulated Brillouin scattering are observed in βZ = 1 type plasmas and β = 1 type plasmas as Z increases; the former is caused by kinetic effects, while the latter is due to the higher growth rates of instability. Our results will have potential application in pulse amplification in the comparable-mass plasmas with charge state Z > 1, such as plasma of C60−/C60+,C602+,C603+ .
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影响因子:
2.4
作者:
IWAMOTO, N
通讯作者:
IWAMOTO, N
影响因子:
16.6
作者:
Sarri, G.;Poder, K.;Cole, J. M.;Schumaker, W.;Di Piazza, A.;Reville, B.;Dzelzainis, T.;Doria, D.;Gizzi, L. A.;Grittani, G.;Kar, S.;Keitel, C. H.;Krushelnick, K.;Kuschel, S.;Mangles, S. P. D.;Najmudin, Z.;Shukla, N.;Silva, L. O.;Symes, D.;Thomas, A. G. R.;Vargas, M.;Vieira, J.;Zepf, M.
通讯作者:
Zepf, M.
影响因子:
2.2
作者:
O. Klimo;S. Weber;V. Tikhonchuk;J. Limpouch
通讯作者:
O. Klimo;S. Weber;V. Tikhonchuk;J. Limpouch
DOI:
10.1632/s0030812900174759
发表时间:
1995-05
期刊:
PMLA/Publications of the Modern Language Association of America
影响因子:
--
作者:
D. Batani;S. Baton;A. Casner;S. Depierreux;M. Hohenberger;O. Klimo;M. Koenig;C. Labaune;X. Ribeyre;C. Rousseaux;G. Schurtz;W. Theobald;V. Tikhonchuk
通讯作者:
D. Batani;S. Baton;A. Casner;S. Depierreux;M. Hohenberger;O. Klimo;M. Koenig;C. Labaune;X. Ribeyre;C. Rousseaux;G. Schurtz;W. Theobald;V. Tikhonchuk
DOI:
10.1063/1.5096850
发表时间:
2019-06
期刊:
Phys. Plasmas
影响因子:
--
作者:
C Z Xiao;H B Zhuo;Y Yan
通讯作者:
Y Yan