An ultrasensitive molybdenum-based double-heterojunction phototransistor.

An ultrasensitive molybdenum-based double-heterojunction phototransistor.
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DOI:
10.1038/s41467-021-24397-x
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发表时间:
2021-07-02
影响因子:
16.6
通讯作者:
Sun DM
Sun DM
中科院分区:
综合性期刊1区
文献类型:
--
作者:
Feng S;Liu C;Zhu Q;Su X;Qian W;Sun Y;Wang C;Li B;Chen M;Chen L;Chen W;Zhang L;Zhen C;Wang F;Ren W;Yin L;Wang X;Cheng HM;Sun DM

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Two-dimensional (2D) materials are promising for next-generation photo detection because of their exceptional properties such as a strong interaction with light, electronic and optical properties that depend on the number of layers, and the ability to form hybrid structures. However, the intrinsic detection ability of 2D material-based photodetectors is low due to their atomic thickness. Photogating is widely used to improve the responsivity of devices, which usually generates large noise current, resulting in limited detectivity. Here, we report a molybdenum-based phototransistor with MoS2 channel and α-MoO3-x contact electrodes. The device works in a photo-induced barrier-lowering (PIBL) mechanism and its double heterojunctions between the channel and the electrodes can provide positive feedback to each other. As a result, a detectivity of 9.8 × 1016 cm Hz1/2 W−1 has been achieved. The proposed double heterojunction PIBL mechanism adds to the techniques available for the fabrication of 2D material-based phototransistors with an ultrahigh photosensitivity. Here, the authors exploit a photo-induced barrier-lowering mechanism in MoS2/ α-MoO3-x heterojunctions to realize two-dimensional phototransistors with enhanced performance and fast response at low bias voltage.
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