Photon-generated carrier transfer process from graphene to quantum dots: optical evidences and ultrafast photonics applications
Photon-generated carrier transfer process from graphene to quantum dots: optical evidences and ultrafast photonics applications
复制标题
从石墨烯到量子点的光子生成载流子转移过程:光学证据和超快光子学应用
DOI:
10.1038/s41699-020-00160-6
复制
发表时间:
2020-07
影响因子:
9.7
通讯作者:
Z. Y. Zhang
中科院分区:
文献类型:
--
作者:
X. Wang;X. H. Li;C. Jiang;C. T. A. Brown;J. Q. Ning;K. Zhang;Q. Yu;X. T. Ge;Q. J. Wang;Z. Y. Zhang
AbstractGraphene/III–V semiconductor van der Waals (vdW) heterostructures offer potential access to physics, functionalities, and superior performance of optoelectronic devices. Nevertheless, the lack of a bandgap in graphene severely restricts the controllability of carrier properties and therefore impedes its applications. Here, we demonstrate the engineering of graphene bandgap in the graphene/GaAs heterostructure via C and Ga exchange induced by the method of femtosecond laser irradiation (FLI). The coupling of the bandgap-opened graphene with GaAs significantly enhances both the harvest of photons and the transfer of photon-generated carriers across the interface of vdW heterostructures. Thus, as a demonstration example, it allows us to develop a saturable absorber combining a delicately engineered graphene/GaAs vdW heterostructure with InAs quantum dots capped with short-period superlattices. This device exhibits significantly improved nonlinear characteristics including
登录
查看更多内容
DOI:
10.1038/s43586-022-00151-5
发表时间:
2014-03
期刊:
Nature Reviews Methods Primers
影响因子:
--
作者:
R. Gorbachev
通讯作者:
R. Gorbachev
影响因子:
38.3
作者:
Das, A.;Pisana, S.;Sood, A. K.
通讯作者:
Sood, A. K.
影响因子:
7.6
作者:
Liu Junmin;Chen Yu;Zheng Shuiqin;Xu Shixiang;Liu Junmin;Li Ying;Zhang Han;Zheng Shuiqin;Xu SX
通讯作者:
Xu SX
DOI:
10.1007/s00340-005-1879-1
发表时间:
2005-06
期刊:
Applied Physics B
影响因子:
--
作者:
G. Spühler;K. Weingarten;R. Grange;L. Krainer;M. Haiml;V. Liverini;M. Golling;S. Schön;U. Keller-U.
通讯作者:
G. Spühler;K. Weingarten;R. Grange;L. Krainer;M. Haiml;V. Liverini;M. Golling;S. Schön;U. Keller-U.
DOI:
10.1109/photwtm.2011.5730035
发表时间:
2011-03
期刊:
IEEE Winter Topicals 2011
影响因子:
--
作者:
G. Fiol;D. Arsenijevic;H. Schmeckebier;C. Meuer;S. Mikhrin;D. Livshits;D. Bimberg
通讯作者:
G. Fiol;D. Arsenijevic;H. Schmeckebier;C. Meuer;S. Mikhrin;D. Livshits;D. Bimberg