High energy soliton pulse generation by a magnetron-sputtering-deposition-grown MoTe2 saturable absorber
High energy soliton pulse generation by a magnetron-sputtering-deposition-grown MoTe2 saturable absorber
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磁控溅射沉积生长的 MoTe2 可饱和吸收体产生高能孤子脉冲
DOI：
10.1364/prj.6.000535
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发表时间：
2018-06
影响因子：
7.6
通讯作者：
Ruan Shuangchen
中科院分区：
文献类型：
--
作者：
Wang Jintao;Jiang Zike;Chen Hao;Li Jiarong;Yin Jinde;Wang Jinzhang;He Tingchao;Yan Peiguang;Ruan Shuangchen
The pulse energy in the ultrafast soliton fiber laser oscillators is usually limited by the well-known wave-breaking phenomenon owing to the absence of a desirable real saturable absorber (SA) with high power tolerance and large modulation depth. Here, we report a type of microfiber-based MoTe2 SA fabricated by the magnetron-sputtering deposition (MSD) method. High-energy wave-breaking free soliton pulses were generated with pulse duration/pulse energy/average output power of 229 fs/2.14 nJ/57 mW in the 1.5 μm regime and 1.3 ps/13.8 nJ/212 mW in the 2 μm regime, respectively. To our knowledge, the generated soliton pulses at 1.5 μm had the shortest pulse duration and the highest output power among the reported erbium-doped fiber lasers mode locked by transition metal dichalcogenides. Moreover, this was the first demonstration of a MoTe2-based SA in fiber lasers in the 2 μm regime, and the pulse energy/output power are the highest in the reported thulium-doped fiber lasers mode locked by two-dimensional materials. Our results suggest that a microfiber-based MoTe2 SA could be used as an excellent photonic device for ultrafast pulse generation, and the MSD technique opens a promising route to produce a high-performance SA with high power tolerance and large modulation depth, which are beneficial for high-energy wave-breaking free pulse generation.
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影响因子：
19
作者：
Lin Zhou;Kai Xu;Kai Xu;Ahmad Zubair;Xu Zhang;Fangping Ouyang;Fangping Ouyang;T. Palacios;M. Dresselhaus;Yongfeng Li;J. Kong
通讯作者：
Lin Zhou;Kai Xu;Kai Xu;Ahmad Zubair;Xu Zhang;Fangping Ouyang;Fangping Ouyang;T. Palacios;M. Dresselhaus;Yongfeng Li;J. Kong
影响因子：
3.8
作者：
Zhang, H.;Lu, S. B.;Loh, K. P.
通讯作者：
Loh, K. P.
影响因子：
3.6
作者：
Ma, J.;Xie, G. Q.;Tang, D. Y.
通讯作者：
Tang, D. Y.
影响因子：
8.6
作者：
Ilday, FO;Buckley, JR;Wise, FW
通讯作者：
Wise, FW
影响因子：
3.8
作者：
Hwanseong Jeong;S. Choi;Mi Hye Kim;F. Rotermund;Y. Cha;D. Jeong;Sang Bae Lee;Kwanil Lee;
通讯作者：
Hwanseong Jeong;S. Choi;Mi Hye Kim;F. Rotermund;Y. Cha;D. Jeong;Sang Bae Lee;Kwanil Lee;