A hillock-like phenomenon with low friction and adhesion on a graphene surface induced by relative sliding at the interface of graphene and the SiO(2) substrate using an AFM tip.
A hillock-like phenomenon with low friction and adhesion on a graphene surface induced by relative sliding at the interface of graphene and the SiO(2) substrate using an AFM tip.
复制标题
使用 AFM 尖端在石墨烯和 SiO2 基底界面上相对滑动引起的石墨烯表面上具有低摩擦力和粘附力的小丘状现象
DOI:
10.1039/c9na00660e
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发表时间:
2020-06-17
影响因子:
4.7
通讯作者:
中科院分区:
文献类型:
--
作者:
Graphene demonstrates high potential as an atomically thin solid lubricant for sliding interfaces in industry. However, graphene as a coating material does not always exhibit strong adhesion to any substrates. When the adhesion of graphene to its substrate weakens, it remains unknown whether relative sliding at the interface exists and how the tribological properties of the graphene coating changes. In this work, we first designed a method to weaken the adhesion between graphene and its SiO2 substrate. Then the graphene with weakened adhesion to its substrate was rubbed using an AFM tip, where we found a novel phenomenon: the monolayer graphene not only no longer protected the SiO2 substrate from deformation and damage, but also prompted the formation of hillock-like structures with heights of approximately tens of nanometers. Moreover, the surface of the hillock-like structure exhibited very low adhesion and a continuously decreasing friction force versus sliding time. Comparing the hillock-like structure on the bare SiO2 surface and the proposed force model, we demonstrated that the emergence of the hillock-like structure (with very low adhesion and continuously decreasing friction) was ascribed to the relative sliding at the graphene/substrate interface caused by the mechanical shear of the AFM tip. Our findings reveal a potential failure of the graphene coating when the adhesion strength between graphene and its substrate is damaged or weakened and provide a possibility for in situ fabrication of a low friction and adhesion micro/nanostructure on a SiO2/graphene surface.
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影响因子:
10.9
作者:
Das, Santanu;Lahiri, Debrupa;Choi, Wonbong
通讯作者:
Choi, Wonbong
影响因子:
3.2
作者:
Lu, Zhixing;Dunn, Martin L.
通讯作者:
Dunn, Martin L.
DOI:
10.3390/ma11081314
发表时间:
2018-07-30
期刊:
Materials (Basel, Switzerland)
影响因子:
--
作者:
Liu L;Zhou M;Li X;Jin L;Su G;Mo Y;Li L;Zhu H;Tian Y
通讯作者:
Tian Y
影响因子:
4.6
作者:
Chen JJ;Meng J;Yu DP;Liao ZM
通讯作者:
Liao ZM
影响因子:
3.7
作者:
Sabio, J.;Seoanez, C.;Sols, F.
通讯作者:
Sols, F.