A bipartite element with allele-specific functions safeguards DNA methylation imprints at the Dlk1-Dio3 locus.
A bipartite element with allele-specific functions safeguards DNA methylation imprints at the Dlk1-Dio3 locus.
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DOI:
10.1016/j.devcel.2021.10.004
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发表时间:
2021-11-22
影响因子:
11.8
通讯作者:
Apostolou E
中科院分区:
文献类型:
--
作者:
Aronson BE;Scourzic L;Shah V;Swanzey E;Kloetgen A;Polyzos A;Sinha A;Azziz A;Caspi I;Li J;Pelham-Webb B;Glenn RA;Vierbuchen T;Wichterle H;Tsirigos A;Dawlaty MM;Stadtfeld M;Apostolou E
Loss of imprinting (LOI) results in severe developmental defects, but the mechanisms preventing LOI remain incompletely understood. Here, we dissect the functional components of the imprinting control region of the essential Dlk1-Dio3 locus (called IG-DMR) in pluripotent stem cells. We demonstrate that the IG-DMR consists of two antagonistic elements: a paternally methylated CpG-island that prevents recruitment of TET dioxygenases and a maternally unmethylated non-canonical enhancer that ensures expression of the Gtl2 lncRNA by counteracting de novo DNA methyltransferases. Genetic or epigenetic editing of these elements leads to distinct LOI phenotypes with characteristic alternations of allele-specific gene expression, DNA methylation and 3D chromatin topology. Although repression of the Gtl2 promoter results in dysregulated imprinting, the stability of LOI phenotypes depends on the IG-DMR, suggesting a functional hierarchy. These findings establish the IG-DMR as a bipartite control element that maintains imprinting by allele-specific restriction of the DNA (de)methylation machinery. Aronson, Scourzic et al. identify gene regulatory elements that ensure epigenetic stability at the major imprinted locus, Dlk1-Dio3, encoding essential developmental regulators. They show that these elements operate by counteracting de novo DNA methylation or demethylation in an allele-specific manner, providing a framework for epigenetic gene expression control.
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影响因子:
8.8
作者:
Das PP;Hendrix DA;Apostolou E;Buchner AH;Canver MC;Beyaz S;Ljuboja D;Kuintzle R;Kim W;Karnik R;Shao Z;Xie H;Xu J;De Los Angeles A;Zhang Y;Choe J;Jun DL;Shen X;Gregory RI;Daley GQ;Meissner A;Kellis M;Hochedlinger K;Kim J;Orkin SH
通讯作者:
Orkin SH
影响因子:
46.9
作者:
Heck, Dirk;Kowalczyk, Monika S.;Yudovich, David;Belizaire, Roger;Puram, Rishi V.;McConkey, Marie E.;Thielke, Anne;Aster, Jon C.;Regev, Aviv;Ebert, Benjamin L.
通讯作者:
Ebert, Benjamin L.
影响因子:
64.5
作者:
Hsu PD;Lander ES;Zhang F
通讯作者:
Zhang F
影响因子:
48
作者:
Danko CG;Hyland SL;Core LJ;Martins AL;Waters CT;Lee HW;Cheung VG;Kraus WL;Lis JT;Siepel A
通讯作者:
Siepel A
影响因子:
4.6
作者:
Hara, Satoshi;Terao, Miho;Takada, Shuji
通讯作者:
Takada, Shuji