Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes.
Lithography-free IR polarization converters via orthogonal in-plane phonons in α-MoO(3) flakes.
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DOI:
10.1038/s41467-020-19499-x
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发表时间:
2020-11-13
影响因子:
16.6
通讯作者:
Aydin K
中科院分区:
文献类型:
--
作者:
Abedini Dereshgi S;Folland TG;Murthy AA;Song X;Tanriover I;Dravid VP;Caldwell JD;Aydin K
Exploiting polaritons in natural vdW materials has been successful in achieving extreme light confinement and low-loss optical devices and enabling simplified device integration. Recently, α-MoO3 has been reported as a semiconducting biaxial vdW material capable of sustaining naturally orthogonal in-plane phonon polariton modes in IR. In this study, we investigate the polarization-dependent optical characteristics of cavities formed using α-MoO3 to extend the degrees of freedom in the design of IR photonic components exploiting the in-plane anisotropy of this material. Polarization-dependent absorption over 80% in a multilayer Fabry-Perot structure with α-MoO3 is reported without the need for nanoscale fabrication on the α-MoO3. We observe coupling between the α-MoO3 optical phonons and the Fabry-Perot cavity resonances. Using cross-polarized reflectance spectroscopy we show that the strong birefringence results in 15% of the total power converted into the orthogonal polarization with respect to incident wave. These findings can open new avenues in the quest for polarization filters and low-loss, integrated planar IR photonics and in dictating polarization control. Here, the authors investigate the polarization-dependent optical characteristics of cavities formed using α-MoO3 to extend the degrees of freedom in the design of IR photonic components exploiting the in-plane anisotropy of this material. Absorption over 80% and polarization conversion is reported without the need for nanoscale fabrication.
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