Statistical Analysis and Modeling of Random Telegraph Noise Based on Gate Delay Measurement
Statistical Analysis and Modeling of Random Telegraph Noise Based on Gate Delay Measurement
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基于门延迟测量的随机电报噪声统计分析和建模
DOI:
10.1109/tsm.2017.2715168
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发表时间:
2017
影响因子:
2.7
通讯作者:
H. Onodera
中科院分区:
文献类型:
--
作者:
A. Islam;Tatsuya Nakai;H. Onodera
We propose a characterization methodology for random telegraph noise (RTN) based on gate delay measurement. To convert delay change to MOSFET threshold voltage fluctuation, <inline-formula> <tex-math notation="LaTeX">$ {\Delta V_{T}}$ </tex-math></inline-formula>, a topology-reconfigurable ring oscillator is utilized. We discuss the issue of detecting RTN-induced discrete fluctuations in the delay and develop a kernel density-based method to detect the fluctuations. Characterization results of several RTN properties from a test chip fabricated in a 65 nm bulk process are presented. Particular focus is given on the suitable distribution to present RTN-induced overall <inline-formula> <tex-math notation="LaTeX">$ {\Delta V_{T}}$ </tex-math></inline-formula> distribution and its gate area dependency. The results show that lognormal distribution is better at representing the total <inline-formula> <tex-math notation="LaTeX">$ {\Delta V_{T}}$ </tex-math></inline-formula> distribution. RTN-induced delay fluctuation of 40% has been observed for a single gate under weak inversion operation. Local process variation and RTN amplitude are found to be uncorrelated. The proposed methodology is thus suitable for characterizing RTN of devices operating under switching condition.
DOI:
--
发表时间:
2015
期刊:
影响因子:
--
作者:
A.K.M.Mahfuzul Islam;Hidetoshi Onodera
通讯作者:
Hidetoshi Onodera
DOI:
--
发表时间:
2016
期刊:
影响因子:
--
作者:
A.K.M. Mahfuzul Islam;Tatsuya Nakai;and Hidetoshi Onodera
通讯作者:
and Hidetoshi Onodera