Quantitative hydrogen state analysis in the leached layer of soda-lime-silica glass by combination of nuclear reaction analysis and C60-X-ray photoelectron spectroscopy
Quantitative hydrogen state analysis in the leached layer of soda-lime-silica glass by combination of nuclear reaction analysis and C60-X-ray photoelectron spectroscopy
复制标题
核反应分析与C60-X射线光电子能谱相结合定量分析钠钙硅玻璃浸出层中的氢态
DOI：
10.1016/j.jnoncrysol.2021.121160
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发表时间：
2021
影响因子：
3.5
通讯作者：
Fukutani Katsuyuki
中科院分区：
文献类型：
--
作者：
Suehara Michinori;Yamamoto Yuichi;Ogura Shohei;Fukutani Katsuyuki
采用核反应分析（NRA）和深度分辨c60 - x射线光电子能谱（XPS）研究了酸处理对钠-石灰-硅玻璃表层的影响。随着HCl处理时间的延长，H的数量增加，分布在深度约为150nm的区域。然而，在近表面区域，15n2 +束辐照对NRA的损伤是巨大的，信号强度随着离子剂量的增加而快速衰减。用C60-XPS检测了表层钠、镁、钙的损耗。酸处理在150nm深度下消耗钠，但镁和钙的消耗发生在大约30nm深度内。假设碱土元素和碱土元素与h30 +发生离子交换反应，通过钠、镁、钙的损耗谱来评价Si-OH浓度谱。根据NRA得到的Si-OH剖面与H分布的差异，估算出浸出层的H2O/Si-OH比值为1.3。
The effects of acid treatment on the surface layer of soda-lime-silica glasses were investigated by nuclear reaction analysis (NRA) and C60-X-ray photoelectron spectroscopy (XPS) in a depth-resolved manner. As the time of treatment with HCl increased, the amount of H increased and was distributed in a region at a depth of almost 150 nm. In the near-surface region, however, the damage due to15N2+beam irradiation for conducting the NRA was found to be substantial as observed by the fast decay of signal intensity with increasing ion dose. The depletion of sodium, magnesium, and calcium in the surface layer was examined by C60-XPS. Sodium was depleted at a depth of 150 nm by the acid treatment, but the depletion of magnesium and calcium occurred at a depth within approximately 30 nm. Assuming the ion exchange reaction between the alkaline and alkaline earth elements with H3O+, the Si-OH concentration profile was evaluated from the depletion profiles of sodium, magnesium, and calcium. From the difference between the Si-OH profile and H distribution obtained by NRA, the H2O/Si-OH ratio in the leached layer was estimated at 1.3.
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使用 C60 离子束对钠钙硅玻璃进行精确的 XPS 深度剖面分析
影响因子：
3.5
作者：
Y. Yamamoto;Kiyoshi Yamamoto
通讯作者：
Kiyoshi Yamamoto
DOI：
10.1007/s0021653530408
发表时间：
1995
期刊：
Fresenius' Journal of Analytical Chemistry
影响因子：
--
作者：
M. Laube;F. Rauch
通讯作者：
F. Rauch
核反应分析测定碱石灰硅酸盐玻璃中水的红外实用消光系数
影响因子：
3.9
作者：
Toshio Suzuki;J. Konishi;Kiyoshi Yamamoto;S. Ogura;K. Fukutani
通讯作者：
K. Fukutani
钠钙硅酸盐玻璃和石英玻璃氮气氛热处理后表面OH基团的变化
影响因子：
3.5
作者：
Toshio Suzuki;Tomomi Sekine;Kiyoshi Yamamoto;K. Fukutani
通讯作者：
K. Fukutani
使用富含氘和 18O 的溶液对钠钙硅玻璃进行浸出研究
DOI：
--
发表时间：
1990
期刊：
--
影响因子：
--
作者：
P. March;F. Rauch
通讯作者：
F. Rauch