Determination of the internal morphology of nanostructures patterned by directed self assembly.
Determination of the internal morphology of nanostructures patterned by directed self assembly.
复制标题
通过定向自组装确定纳米结构的内部形态。
DOI：
10.1021/nn5029289
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发表时间：
2014
期刊：
影响因子：
17.1
通讯作者：
R. Joseph Kline
中科院分区：
文献类型：
--
作者：
D. Sunday;Matthew R. Hammond;Chengqing C. Wang;Wen;D. Delongchamp;Melia Tjio;Joy Y. Cheng;J. Pitera;R. Joseph Kline
嵌段共聚物（BCP）的定向自组装（DSA）是一种新兴的分辨率增强工具，其可以倍增或细分光刻限定的化学或拓扑图案的间距，并且是增强用于图案化亚20 nm特征的常规光刻的分辨率增强候选者。继续开发这项技术将需要更好地理解所涉及的聚合物物理学以及用于指导设计过程的模拟的实验确认。这两种努力都将通过能够探测DSA膜的内部形态的计量学来极大地促进。我们已经开发了一种新的测量技术，共振临界尺寸小角X射线散射（res-CDSAXS），以评估薄膜内的三维掩埋功能。这是一种X射线散射测量，其中改变样品角度以探测薄膜的3D结构，同时使用共振软X射线来增强散射对比度。通过使用res-CDSAXS和传统的CDSAXS（硬X射线）测量相同的样品，我们能够证明通过使用共振软X射线获得的散射的显着改善。从res-CDSAXS测量构建的倒易空间图的分析，使我们能够重建复杂的埋在DSA BCP电影的功能。我们研究了一系列具有不同模板宽度的DSA BCP薄膜，并将这些样品的内部形貌与平均场模拟中的单链结果进行了比较。测量揭示了一系列的形态，发生变化的模板宽度，包括结果表明，存在的混合形态组成的整体和颈缩薄片。res-CDSAXS的发展将使人们能够更好地理解DSA BCP薄膜中掩埋特征形成背后的基本物理过程。
The directed self-assembly (DSA) of block copolymers (BCP) is an emerging resolution enhancement tool that can multiply or subdivide the pitch of a lithographically defined chemical or topological pattern and is a resolution enhancement candidate to augment conventional lithography for patterning sub-20 nm features. Continuing the development of this technology will require an improved understanding of the polymer physics involved as well as experimental confirmation of the simulations used to guide the design process. Both of these endeavors would be greatly facilitated by a metrology, which is capable of probing the internal morphology of a DSA film. We have developed a new measurement technique, resonant critical-dimension small-angle X-ray scattering (res-CDSAXS), to evaluate the 3D buried features inside the film. This is an X-ray scattering measurement where the sample angle is varied to probe the 3D structure of the film, while resonant soft X-rays are used to enhance the scattering contrast. By measuring the same sample with both res-CDSAXS and traditional CDSAXS (with hard X-rays), we are able to demonstrate the dramatic improvement in scattering obtained through the use of resonant soft X-rays. Analysis of the reciprocal space map constructed from the res-CDSAXS measurements allowed us to reconstruct the complex buried features in DSA BCP films. We studied a series of DSA BCP films with varying template widths, and the internal morphologies for these samples were compared to the results of single chain in mean-field simulations. The measurements revealed a range of morphologies that occur with changing template width, including results that suggest the presence of mixed morphologies composed of both whole and necking lamella. The development of res-CDSAXS will enable a better understanding of the fundamental physics behind the formation of buried features in DSA BCP films.
抗蚀图案引导对称二嵌段共聚物自组装
DOI：
--
发表时间：
2006
期刊：
Journal of Photopolymer Scinece and Technology 19
影响因子：
--
作者：
三浦陽子;他;T. Yamaguchi
通讯作者：
T. Yamaguchi