Effect of high energy shot peening on the wear resistance of TiN films on a TA2 surface
Effect of high energy shot peening on the wear resistance of TiN films on a TA2 surface
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高能喷丸对TA2表面TiN薄膜耐磨性的影响
DOI：
10.1016/j.surfcoat.2019.07.045
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发表时间：
2019-07
影响因子：
5.4
通讯作者：
Bin Gan
中科院分区：
文献类型：
--
作者：
Conghui Zhang;Min Zheng;Yaomian Wang;Peng Gao;Bin Gan
采用脉冲磁控溅射的方法，在高能喷丸（HESP）处理和未处理的纯钛TA2表面沉积TiN薄膜。采用扫描电子显微镜（SEM）和x射线衍射仪（XRD）分析了TiN薄膜的形貌和晶体结构。采用划痕仪和纳米压痕仪测量了TiN薄膜的薄膜-衬底附着力、硬度和弹性模量。用微摩擦试验机对TiN薄膜的耐磨性进行了测试。结果表明，与原始纯钛相比，经HESP处理的TA2表面缺陷较多，化学活性高，使得表面在溅射过程中能够快速捕获和固定Ti和N等离子体，诱导非均相成核，从而使TiN膜晶粒尺寸细化，薄膜更厚、更致密。随着HESP时间的延长，膜-底物的粘附力从原始TA2的20.1 N增加到30 min后的39.2 N， TiN膜的纳米硬度从原始TA2的14.0 GPa增加到30 min后的29.7 GPa。HESP处理能稳定TiN薄膜的摩擦系数，提高其耐磨性。TiN膜的比磨损率从原始TA2的0.061 mm3/N·m下降到经过30 min hesp处理的TA2的0.029 mm3/N·m。
TiN films were deposited by pulsed magnetron sputtering on the surface of pure titanium TA2 treated or not treated with high-energy shot peening (HESP). The morphology and crystal structure of the TiN thin films were analyzed by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The film-substrate adhesion, hardness and modulus of elasticity of the TiN films were measured by a scratch tester and a nanoindentation tester. The wear resistance of the TiN films was measured by a microtribotester. The results showed that, compared with the original pure titanium, the TA2 surface treated by HESP exhibited a large number of defects and a high chemical activity, which enabled the surface to quickly capture and fix Ti and N plasma during the sputtering process and induced heterogeneous nucleation, thus leading to the refinement of the grain size of the TiN film and a thicker and denser film. With prolongation of the HESP time, film-substrate adhesion increased from 20.1 N for the original TA2 to 39.2 N for the 30-min HESP-treated TA2, and the nanohardness of the TiN films increased from 14.0 GPa for the original TA2 to 29.7 GPa for the 30-min HESP-treated TA2. HESP treatment could stabilize the friction coefficient and improve the wear resistance of TiN thin films. The specific wear rate of TiN films decreased from 0.061 mm3/N·m for the original TA2 to 0.029 mm3/N·m for the 30-min HESP-treated TA2.
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影响因子：
6.7
作者：
O. Lenivtseva;I. Bataev;M. Golkovskii;A. Bataev;V. V. Samoilenko-V.;N. Plotnikova
通讯作者：
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影响因子：
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作者：
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通讯作者：
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影响因子：
5.4
作者：
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通讯作者：
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