Adaptive microphase measuring profilometry for three-dimensional shape reconstruction of a shiny surface
Adaptive microphase measuring profilometry for three-dimensional shape reconstruction of a shiny surface
复制标题
用于闪亮表面三维形状重建的自适应微相测量轮廓术
DOI：
10.1117/1.oe.59.1.014104
复制
发表时间：
2020-01
影响因子：
1.3
通讯作者：
Feifei Gu
中科院分区：
文献类型：
--
作者：
Suming Tang;Feifei Gu
摘要。由于在捕获图像的图像饱和区域会产生严重的测量误差，因此对现有的结构光技术来说，对闪亮表面进行三维重建是一个巨大的挑战。为此，提出了一种自适应微相位测量轮廓术（AMPMP）。该方法引入了一种最优选频策略来选择相移条纹图的频率。通过在光滑表面上投影一系列均匀的灰度模式，通过拟合非线性函数估计投影模式与捕获图像之间的强度关系，并利用MPMP建立的投影仪图像平面与相机图像平面的对应关系计算捕获图像中饱和区域的映射区域。根据估计的强度关系和映射区域，自适应调整饱和区域的最优投影强度。然后，对调整后的相移条纹图进行投影，得到发光表面的绝对相位分布。从而实现了精确的三维形状重建。实验结果表明，该方法可以很好地处理光滑表面的饱和区域，比其他常用的自适应条纹投影技术具有更高的性能。
Abstract. Three-dimensional (3-D) reconstruction of a shiny surface is a great challenge for existing structured light techniques because serious measurement errors will occur in image saturation regions in the captured image. To this end, an adaptive microphase measuring profilometry (AMPMP) is proposed. In this method, an optimal frequency selection strategy is introduced to select the frequencies of phase-shifted fringe patterns. The intensity relation between the projected pattern and the captured image is estimated by fitting a nonlinear function after projecting a series of uniform gray-level patterns onto the shiny surface, and the mapping regions of saturated areas in the captured image are computed with the correspondence between the projector image plane and the camera image plane, which is established through MPMP. Based on the estimated intensity relation and the mapping regions, the optimal projection intensities of saturated areas are adaptively adjusted. Then, the adjusted phase-shifted fringe patterns are projected to obtain the absolute phase distribution of the shiny surface. Therefore, accurate 3-D shape reconstruction is realized. The experimental results demonstrated that the proposed AMPMP can well tackle saturated areas of shiny surfaces and has greater performance than other commonly used adaptive fringe projection techniques.
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影响因子：
3.8
作者：
Joongki Jeong;M. Y. Kim
通讯作者：
Joongki Jeong;M. Y. Kim
影响因子：
3.8
作者：
Lin, Hui;Gao, Jian;Wang, Xingjin
通讯作者：
Wang, Xingjin
从相机图像角度进行投影仪标定
影响因子：
1.3
作者：
Zhang X;Zhu LM
通讯作者：
Zhu LM
影响因子：
4.6
作者：
Suming Tang;Xu Zhang;Dawei Tu
通讯作者：
Suming Tang;Xu Zhang;Dawei Tu
DOI：
10.1109/isot.2010.5687390
发表时间：
2010-10
期刊：
2010 International Symposium on Optomechatronic Technologies
影响因子：
--
作者：
C. Waddington;J. Kofman
通讯作者：
C. Waddington;J. Kofman