1.28μm lasing from stacked InAs∕GaAs quantum dots with low-temperature-grown AlGaAs cladding layer by metalorganic chemical vapor deposition
1.28μm lasing from stacked InAs∕GaAs quantum dots with low-temperature-grown AlGaAs cladding layer by metalorganic chemical vapor deposition
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采用金属有机化学气相沉积法,采用低温生长 AlGaAs 包层堆叠 InAs∕GaAs 量子点发射 1.28μm 激光
DOI:
10.1063/1.1857075
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发表时间:
2005
影响因子:
4
通讯作者:
A. Kuramata
中科院分区:
文献类型:
--
作者:
J. Tatebayashi;N. Hatori;M. Ishida;H. Ebe;M. Sugawara;Y. Arakawa;H. Sudo;A. Kuramata
We report the device characteristics of stacked InAs∕GaAs quantum-dot lasers cladded by Al0.4Ga0.6As layer grown at a low temperature by metalorganic chemical vapor deposition. A blueshift in emission energy by the effect of postgrowth annealing can be suppressed when the annealing temperature is below 570°C. We achieved the 1.28μm continuous-wave lasing at room temperature of five layer stacked InAs∕GaAs quantum dots embedded in In0.13Ga0.87As strain-reducing layer whose p-cladding layer is grown at 560°C. From the experiments and calculations of the gain spectra of fabricated quantum-dot lasers, the observed lasing originates from the first excited state of stacked InAs quantum dots.
DOI:
10.1143/jjap.43.l1124
发表时间:
2004-08-15
期刊:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
影响因子:
--
作者:
Otsubo, K;Hatori, N;Arakawa, Y
通讯作者:
Arakawa, Y
影响因子:
4
作者:
ARAKAWA, Y;SAKAKI, H
通讯作者:
SAKAKI, H
DOI:
--
发表时间:
2004
期刊:
Applied Physics Letters 85・6
影响因子:
--
作者:
J.Tatebayashi;Y.Arakawa;N.Hatoi;H.Ebe;M.Sugawara;H.Sudo;A.Kuramata
通讯作者:
A.Kuramata