Multipactor suppression in dielectric-assist accelerating structures via diamondlike carbon coatings

Multipactor suppression in dielectric-assist accelerating structures via diamondlike carbon coatings
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通过类金刚石碳涂层对介电辅助加速结构进行多重抑制

DOI:
10.1103/physrevaccelbeams.24.022001
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发表时间:
2021
影响因子:
1.7
通讯作者:
Satoh Daisuke
Satoh Daisuke
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Mori Shingo;Yoshida Mitsuhiro;Satoh Daisuke

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介质辅助加速(DAA)腔是一种驻波加速腔,通过利用介质层的反射,在室温下达到超过100,000的Q值; DAA腔预计将用于小型射频电源和高负载操作。到目前为止,DAA腔的最大加速场已被限制在几MV/m的二次电子倍增器放电。在加速器领域中,次级电子倍增器放电被广泛观察到,并且已经研究了其抑制以改善加速器性能。通过施加类金刚石碳(DLC)涂层来降低二次电子发射系数而不牺牲腔的Q值,我们已经证明,脉冲长度为的C波段射频脉冲可以注入到具有大于10 [MV/m]的场的DAA腔中,同时抑制二次电子倍增器放电。
A dielectric-assist accelerating (DAA) cavity is a standing-wave accelerating cavity that attains a Q-value of over 100,000 at room temperature by using the reflection of the dielectric layer; the DAA cavity is expected to be used with a small rf power source and high-duty operation. Thus far, the maximum accelerating field of DAA cavities has been limited to a few MV/m by the multipactor discharges. Multipactor discharges are widely observed in the accelerator field, and their suppression has been studied to improve accelerator performance. By applying a diamondlike carbon (DLC) coating to reduce the secondary electron emission coefficient without sacrificing the Q-value of the cavity, we have demonstrated that a C-band rf pulse with a pulse length ofcan be injected into a DAA cavity with a field of more than 10 [MV/m] while suppressing the multipactor discharges.
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