Intrinsic defects of GaSe

Intrinsic defects of GaSe
复制标题

GaSe的本征缺陷

DOI:
10.1088/1361-648x/ab7fdb
复制
发表时间:
2020-03
期刊:
Journal of Physics: Condensed Matter
影响因子:
--
通讯作者:
Thomas Frauenheim
Thomas Frauenheim
中科院分区:
其他
文献类型:
--
作者:
Peter Deák;Miaomiao Han;Michael Lorke;Meisam Farzalipour Tabriz;Thomas Frauenheim

文献摘要

参考文献

相似文献

GaSe是一种层状半导体,其光学带隙可通过薄膜中的层数来调节。这在微光电子学和光伏学领域具有广阔的应用前景。然而,要做到这一点,就需要了解内在缺陷,因为它们可能会影响器件的行为。在这里,我们提出了一个全面的研究本体和单层(ML) GaSe的内在点缺陷,使用一个优化的混合函数,再现带隙和Koopmans兼容。计算了形成能和电荷跃迁能级,后者与现有实验数据吻合较好。我们发现唯一的本征供体是层间镓间隙,而在ML中没有。空位是受体,硒间隙是电非活性的,小的本征缺陷配合物的形成能太高,无法在准平衡条件下生长的样品的电子性质中发挥作用。本体GaSe可以很好地补偿固有缺陷,是一种理想的衬底。ML本质上是p型的,p型掺杂也不能补偿。带隙的打开大大改变了相对于本体的缺陷物理特性。
GaSe is a layered semiconductor with an optical band gap tunable by the number of layers in a thin film. This is promising for application in micro/optoelectronics and photovoltaics. However, for that, knowledge about the intrinsic defects are needed, since they may influence device behavior. Here we present a comprehensive study of intrinsic point defects in both bulk and monolayer (ML) GaSe, using an optimized hybrid functional which reproduces the band gap and is Koopmans’ compliant. Formation energies and charge transition levels are calculated, the latter in good agreement with available experimental data. We find that the only intrinsic donor is the interlayer gallium interstitial, which is absent in the case of the ML. The vacancies are acceptors, the selenium interstitial is electrically inactive, and small intrinsic defect complexes have formation energies too high to play a role in the electronic properties of samples grown under quasi-equilibrium conditions. Bulk GaSe is well compensated by the intrinsic defects, and is an ideal substrate. The ML is intrinsically p-type, and p-type doping cannot be compensated either. The opening of the band gap changes the defect physics considerably with respect to the bulk.
DOI: 10.1063/1.1609045
发表时间: 2003-09
影响因子: 3.2
作者:
S. Shigetomi;T. Ikari
通讯作者: S. Shigetomi;T. Ikari
DOI: 10.1016/j.commatsci.2017.07.020
发表时间: 2017-11
影响因子: 3.3
作者:
B. P. Bahuguna;L. Saini;Rajesh O. Sharma;B. Tiwari
通讯作者: B. P. Bahuguna;L. Saini;Rajesh O. Sharma;B. Tiwari
DOI: --
发表时间: 2013-11
期刊: arXiv: Materials Science
影响因子: --
作者:
P. Deák;B. Aradi;M. Kaviani;T. Frauenheim;Á. Gali
通讯作者: P. Deák;B. Aradi;M. Kaviani;T. Frauenheim;Á. Gali
DOI: 10.1073/pnas.30.9.244
发表时间: 1944-01-01
影响因子: 11.1
作者:
Murnaghan, FD
通讯作者: Murnaghan, FD
DOI: 10.1103/physrevb.54.11169
发表时间: 1996-10-15
期刊: PHYSICAL REVIEW B
影响因子: 3.7
作者:
Kresse, G;Furthmuller, J
通讯作者: Furthmuller, J