Emission Spectroscopy of Pulsed Powered Microplasma for Surface Treatment of PEN Film
Emission Spectroscopy of Pulsed Powered Microplasma for Surface Treatment of PEN Film
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用于 PEN 薄膜表面处理的脉冲动力微等离子体发射光谱
DOI：
10.1109/ias.2010.5614482
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发表时间：
2010
期刊：
影响因子：
--
通讯作者：
K. Shimizu
中科院分区：
文献类型：
--
作者：
M. Blajan;A. Umeda;S. Muramatsu;K. Shimizu
微等离子体可以在许多应用中找到。该技术也用于聚合物的表面处理。微等离子体表面处理工艺环境友好，即使在常压下放电电压也相对较低（约1 kV），电源和反应器体积小，成本低。本文介绍了用氩气和氩气与N2、O2的混合物对聚萘二甲酸乙二醇酯（PEN）薄膜进行微等离子体表面处理的方法。利用发射光谱法对微等离子体过程进行了分析。实验用带MOSFET开关的马克思发生器作为脉冲高压电源。发射光谱由ICCD相机、光谱仪和光电倍增管测量。通过测量微等离子体表面处理前后的接触角，确定了PEN膜的表面润湿性。结果表明，在O2/Ar混合的情况下，PEN膜的接触角减小。x射线光电子能谱（XPS）分析表明，碳-氢键对应的碳- 1s减少。在Ar/ Ar混合物中，微等离子体放电的发射光谱显示出Ar峰、OH峰、N2第二正带体系峰（N2 SPS）和N2第一正带体系峰（N2 FPS），并且在O2/Ar混合物中，ArI和OH的峰强度有所降低。在0.25% N2 + Ar条件下，微等离子体放电时N2 SPS的寿命发射信号约为1µs。微等离子体的旋转温度和电子温度计算表明，旋转温度低，电子温度高。
Microplasma can be found in many applications. The technology is used also for surface treatment of polymers. The process of surface treatment by microplasma is environmental friendly and could be realized at low cost due to the relatively low discharge voltage (around 1 kV) even under atmospheric pressure and small size of power supply and reactor. This paper presents the surface treatment by microplasma of PEN (polyethylene naphthalate) film using Ar gas and mixtures of Ar with N2 and O2. Microplasma process was analyzed by emission spectroscopy method. An experimental Marx generator with MOSFET switches was used as a pulsed high voltage power supply. The emission spectra were measured by an ICCD camera, a spectrometer, and a photomultiplier tube. Surface wettability of PEN film was confirmed measuring contact angle before and after the microplasma surface treatment. It was observed that contact angle of PEN film was decreased especially with O2/Ar mixture. Analysis by X-ray photoelectron spectrometer (XPS) showed the decrease of C1s, which correspond to C-H bond. Emission spectrum of microplasma discharge in Ar/N2 mixture showed Ar peaks, OH peaks, N2 second positive band system peaks (N2 SPS) and N2 first positive band system peaks (N2 FPS) and a decrease in peaks intensities of ArI and OH for microplasma discharge in O2/Ar mixture. Lifetime emission signals for N2 SPS for the microplasma discharge in 0.25% N2 in Ar was around 1 µs. The calculation of microplasma rotational and electron temperatures show low rotational and high electron temperature.
影响因子：
1.5
作者：
Heeren, T;Ueno, T;Akiyama, H
通讯作者：
Akiyama, H