A valence-selective X-ray fluorescence holography study of an yttrium oxide thin film
A valence-selective X-ray fluorescence holography study of an yttrium oxide thin film
复制标题
氧化钇薄膜的价选择性 X 射线荧光全息研究
DOI:
10.1107/s1600576717012821
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发表时间:
2017
影响因子:
6.1
通讯作者:
Hayashi K.
中科院分区:
文献类型:
--
作者:
Stellhorn J. R.;Hosokawa S.;Happo N.;Tajiri H.;Matsushita T.;Kaminaga K.;Fukumura T.;Hasegawa T.;Hayashi K.
The first direct valence-selective structure determination by X-ray fluorescence holography is reported. The method is applied to investigate an epitaxial thin film of the rare earth monoxide YO, which has recently been synthesized by pulsed laser deposition. The surface of the sample is easily oxidized to Y2O3. In order to separate the structural information connected with the two different valence states of Y, the X-ray fluorescence holography measurements were performed close to the Y K absorption edge. Using the shift of the absorption edge for the different valence states, very different relative contributions of YO and Y2O3 are obtained. Thus, it is possible to distinguish the crystal structures of YO and Y2O3 in the thin-film sample.
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影响因子:
5.5
作者:
Y. Takahashi;K. Hayashi;E. Matsubara
通讯作者:
E. Matsubara
影响因子:
3.7
作者:
T.;C. Bihler;W. Schoch;W. Limmer;J. Daeubler;S. Thiess;M. Brandt;J. Zegenhagen
通讯作者:
J. Zegenhagen
影响因子:
0.7
作者:
T. Matsushita
通讯作者:
T. Matsushita
DOI:
--
发表时间:
2008
期刊:
Phys. Rev. B 78
影响因子:
--
作者:
T. Matsushita;F. Z. Guo;M. Suzuki;F. Matsui;H. Daimon;K. Hayashi
通讯作者:
K. Hayashi
影响因子:
3.7
作者:
P. Korecki;M. Tolkiehn;D. Novikov;G. Materlik;M. Szymoński
通讯作者:
M. Szymoński