Interfacial effect on the ferromagnetic damping of CoFeB thin films with different under-layers
Interfacial effect on the ferromagnetic damping of CoFeB thin films with different under-layers
复制标题
不同底层CoFeB薄膜铁磁阻尼的界面效应
DOI:
10.1063/1.4813763
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发表时间:
2013-07
影响因子:
4
通讯作者:
Jin, Q. Y.
中科院分区:
文献类型:
--
作者:
Zhang, Zongzhi;Ma, B.;Lou, S. T.;Jin, Q. Y.
Interfacial effects on magnetic properties are investigated for the as-deposited and annealed Co64Fe16B20 films with different under-layers (Cu, Ru, or Pd). The intrinsic Gilbert damping factor is inferred to be slightly lower than the obtained value of 0.007. We found that both the in-plane coercivity Hc and ferromagnetic resonance linewidth ΔHpp rely on the interfacial morphology. The Cu under-layer provides a rough surface, which offers an extra contribution to the ΔHpp. The surface roughness was greatly enhanced by post-annealing for Cu, while little affected for Ru and Pd. Resultingly, the ΔHpp and Hc of Cu/CoFeB increase significantly after annealing. However, for the annealed Ru/CoFeB sample, the ΔHpp even decreases implying Ru is a proper under-layer material for CoFeB-based spintronic devices.
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影响因子:
3.2
作者:
Yanyan Zhu;Zongzhi Zhang;B. Ma;Q. Jin
通讯作者:
Yanyan Zhu;Zongzhi Zhang;B. Ma;Q. Jin
影响因子:
4
作者:
Yaping Zhang;X. Fan;Weigang Wang;X. Kou;R. Cao;Xing Chen;C. Ni;L. Pan;J. Xiao
通讯作者:
Yaping Zhang;X. Fan;Weigang Wang;X. Kou;R. Cao;Xing Chen;C. Ni;L. Pan;J. Xiao
影响因子:
4
作者:
Djayaprawira, DD;Tsunekawa, K;Ando, K
通讯作者:
Ando, K
影响因子:
3.2
作者:
K. Eid;R. Fonck;M. A. Darwish;W. Pratt;J. Bass
通讯作者:
K. Eid;R. Fonck;M. A. Darwish;W. Pratt;J. Bass
影响因子:
3.7
作者:
Jedema, FJ;Nijboer, MS;van Wees, BJ
通讯作者:
van Wees, BJ