Subsurface defect of the SiOx film imaged by atomic force acoustic microscopy
Subsurface defect of the SiOx film imaged by atomic force acoustic microscopy
复制标题
用原子力声学显微镜成像的 SiOx 薄膜的次表面缺陷
DOI：
10.1016/j.optlaseng.2009.12.014
复制
发表时间：
2010-11
影响因子：
4.6
通讯作者：
He cunfu
中科院分区：
文献类型：
--
作者：
Wu Bin;Zhang Gaimei;Wu Zaiqi;He cunfu
Atomic force acoustic microscopy (AFAM) has been developed in order to evaluate mechanical properties of the materials at nano-scale. The SiOxfilms on the silicon wafer and glass slide were prepared by plasma enhanced chemical vapor deposition (PECVD) and their properties were characterized by atomic force acoustic microscopy (AFAM). The images of the amplitude of the vibrating cantilever were visualized for the sample vibrating at the ultrasonic frequency and the characteristics of the images were also discussed at the different excitation frequencies. The results showed that the acoustic amplitude images can provide information about the local elasticity and the subsurface defects of the materials qualitatively.
登录
查看更多内容
影响因子：
5.4
作者：
R. Thyen;A. Weber;C. Klages
通讯作者：
R. Thyen;A. Weber;C. Klages
DOI：
10.1116/1.577976
发表时间：
1992-07
期刊：
Journal of Vacuum Science and Technology
影响因子：
--
作者：
R. Mallik;P. Henriksen;T. Butler;W. J. Kulnis;T. Confer
通讯作者：
R. Mallik;P. Henriksen;T. Butler;W. J. Kulnis;T. Confer
DOI：
10.1016/j.physe.2007.07.012
发表时间：
2008-05
影响因子：
3.3
作者：
D. Passeri;M. Rossi;A. Alippi;A. Bettucci;M. Terranova;E. Tamburri;F. Toschi
通讯作者：
D. Passeri;M. Rossi;A. Alippi;A. Bettucci;M. Terranova;E. Tamburri;F. Toschi
影响因子：
2.1
作者：
C. P. Barker;K. Kochem;K. M. Revell;R. Kelly;J. Badyal
通讯作者：
C. P. Barker;K. Kochem;K. M. Revell;R. Kelly;J. Badyal
影响因子：
5.4
作者：
M. Walker;F. Meermann;Joachim Schneider;K. Bazzoun;J. Feichtinger;A. Schulz;J. Krüger;U. Schumacher
通讯作者：
M. Walker;F. Meermann;Joachim Schneider;K. Bazzoun;J. Feichtinger;A. Schulz;J. Krüger;U. Schumacher