Planar surface implanted diffractive grating couplers in SOI.
Planar surface implanted diffractive grating couplers in SOI.
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SOI 中平面表面植入的衍射光栅耦合器。
DOI：
10.1364/oe.22.001077
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发表时间：
2014
期刊：
影响因子：
3.8
通讯作者：
G. Reed
中科院分区：
文献类型：
--
作者：
R. Topley;L. O’Faolain;D. Thomson;F. Gardes;G. Mashanovich;G. Reed
光栅耦合器用于有效地将光从光纤耦合到硅波导，因为它们允许光耦合到器件上的任何位置或从器件上的任何位置耦合出来，而不需要分裂。然而，使用典型的表面浮雕光栅制造方法降低了表面平面度，因此使得进一步的处理更加困难。在光栅耦合器的顶部上制造高质量材料层的能力允许为多层集成光学电路实现多个有源光学层，并且可以实现光学和电子电路在单独层上的单片集成。此外，折射率变化的性质可以使得能够经由用于晶片级测试应用的快速热退火来去除。我们证明了第一次利用晶格无序引入的折射率变化的耦合器件。模拟结果表明，44%的功率可以通过使用均匀的植入光栅，这是没有不同的性能，目前使用的典型的均匀表面浮雕光栅从波导中提取。已证明每个耦合器的经验确定的损耗为5.5 dB。
Grating couplers are used to efficiently couple light from an optical fibre to a silicon waveguide as they allow light to be coupled into or out from any location on the device without the need for cleaving. However, using the typical surface relief grating fabrication method reduces surface planarity and hence makes further processing more difficult. The ability to manufacture high quality material layers on top of a grating coupler allows multiple active optical layers to be realized for multi-layer integrated optical circuits, and may enable monolithic integration of optical and electronic circuits on separate layers. Furthermore, the nature of the refractive index change may enable removal via rapid thermal annealing for wafer scale testing applications. We demonstrate for the first time a coupling device utilising a refractive index change introduced by lattice disorder. Simulations show 44% of the power can be extracted from the waveguide by using uniform implanted gratings, which is not dissimilar to the performance of typical uniform surface relief gratings currently used. Losses determined empirically, of 5.5 dB per coupler have been demonstrated.
具有低沉积温度的热线多晶硅波导。
影响因子：
3.6
作者：
Masaud TM
通讯作者：
Masaud TM