Reaction products and oxide thickness formed by Ti out-diffusion and oxidization in poly-Pt/Ti/SiO2/Si with oxide films deposited
Reaction products and oxide thickness formed by Ti out-diffusion and oxidization in poly-Pt/Ti/SiO2/Si with oxide films deposited
复制标题
沉积氧化膜的poly-Pt/Ti/SiO2/Si中Ti向外扩散和氧化形成的反应产物和氧化物厚度
DOI：
10.1016/j.apsusc.2005.12.111
复制
发表时间：
2006
期刊：
影响因子：
--
通讯作者：
X. Wu
中科院分区：
文献类型：
--
作者：
Changhong Chen;D. Huang;Weiguang Zhu;Yi;X. Wu
在本文中，我们提出的实验结果，以提高商业poly-Pt/Ti/SiO2/Si晶片与钙钛矿氧化物膜沉积时，在流动的氧气环境中热处理的Ti外扩散和氧化的理解。结果表明，在550和600°C热处理时，界面反应产物分别为PtTi 3 +PtTi和PtTi;在650°C及以上热处理时，产物由合金变为三层钛氧化物。经证实为金红石型TiO_2，前两层间隔65 nm，第一层60 nm厚，第二层35 nm厚。此外，下一层作为阻挡层形成，以阻挡Ti的连续扩散路径，从而导致通过残余Ti氧化形成的最后一层TiO 2 − x。
In the paper, we present experimental results to enhance the understanding of Ti out-diffusion and oxidization in commercial poly-Pt/Ti/SiO2/Si wafers with perovskite oxide films deposited when heat-treated in flowing oxygen ambient. It indicates that when heat-treated at 550 and 600°C, PtTi3+PtTi and PtTi are the reaction products from interfacial interaction, respectively; while heat-treated at 650°C and above, the products become three layers of titanium oxides instead of the alloys. Confirmed to be rutile TiO2, the first two layers spaced by 65nm encapsulate the Pt surface by the first layer with 60nm thick forming at its surface and by the next layer with 35nm thick inserting its original layer. In addition, the next layer is formed as a barrier to block up continuous diffusion paths of Ti, and thus results in the last layer of TiO2−xformed by the residual Ti oxidizing.
影响因子：
4
作者：
Ha, HK;Yoshimoto, M;Ishiwara, H
通讯作者：
Ishiwara, H