Electrodeposition of macroporous magnetic metal films using colloidal nickel phosphate templates

Electrodeposition of macroporous magnetic metal films using colloidal nickel phosphate templates
复制标题

使用胶体磷酸镍模板电沉积大孔磁性金属薄膜

DOI:
10.1016/j.matlet.2007.03.098
复制
发表时间:
2007-11
期刊:
影响因子:
3
通讯作者:
潘伟
潘伟
中科院分区:
材料科学3区
文献类型:
--
作者:
潘伟

文献摘要

参考文献

被引文献

相似文献

通过简单的模板化电沉积路线合成了具有随机分布的球形孔(直径 90-210 nm)的二维 (2D) 和三维 (3D) 大孔镍基薄膜。通过电泳沉积(EPD)均匀沉淀法制备的胶体磷酸镍颗粒,在掺锡 In2O3(ITO)镀膜玻璃上构建多孔模板。随后在电沉积浴中进行金属填充,并将模板溶解在硫酸铵溶液中获得多孔薄膜。通过调节沉积电荷,多孔薄膜的厚度可以控制在100纳米到几十微米之间。研究了多孔薄膜的室温磁性能,观察到其矫顽力和方形度比相应的普通薄膜显着增强。
Two-dimensional (2D) and three-dimensional (3D) macroporous nickel based films with randomly distributed spherical pores (diameter 90–210 nm) were synthesized by a simple templated electrodeposition route. Porous templates on Sn doped In2O3(ITO) coated glass were constructed via electrophoretic deposition (EPD) of colloidal nickel phosphate particles prepared by a homogeneous precipitation method. The infilling of metal was sequently carried out in an electrodeposition bath, and porous films were obtained by dissolving the templates in ammonium sulfate solution. By adjusting the deposition charge, the thickness of the porous films could be controlled from 100 nm to tens of microns. Room temperature magnetic properties of the porous films were studied, remarkably enhanced coercivity and squareness than that of corresponding plain films were observed.
DOI: 10.1002/1521-4095(200102)13:4
发表时间: 2001-02
期刊: Advanced Materials
影响因子: 29.4
作者:
H. Masuda;T. Yanagishita;K. Yasui;K. Nishio;Ichizo Yagi;T. Rao;A. Fujishima
通讯作者: H. Masuda;T. Yanagishita;K. Yasui;K. Nishio;Ichizo Yagi;T. Rao;A. Fujishima
DOI: 10.1002/(sici)1521-4095(200006)12:11
发表时间: 2000-06
期刊: Advanced Materials
影响因子: 29.4
作者:
Wei Yu;Jian Pei;Weimin Huang;A. Heeger
通讯作者: Wei Yu;Jian Pei;Weimin Huang;A. Heeger
DOI: 10.1103/physrevb.64.184430
发表时间: 2001-10
期刊: Physical Review B
影响因子: 3.7
作者:
Li Sun;Yang Ding;C. Chien;P. Searson
通讯作者: Li Sun;Yang Ding;C. Chien;P. Searson
DOI: 10.1021/cm020272w
发表时间: 2002-11-01
影响因子: 8.6
作者:
Chu, SZ;Wada, K;Hono, K
通讯作者: Hono, K
DOI: 10.1039/b000404i
发表时间: 2000
影响因子: 4.9
作者:
Lianbin Xu;Weilie Zhou;C. Frommen;R. Baughman;A. Zakhidov;L. Malkinski;J. Q. Wang;J. Wiley
通讯作者: Lianbin Xu;Weilie Zhou;C. Frommen;R. Baughman;A. Zakhidov;L. Malkinski;J. Q. Wang;J. Wiley