Locally Erasable Couplers for Optical Device Testing in Silicon on Insulator
Locally Erasable Couplers for Optical Device Testing in Silicon on Insulator
复制标题
用于绝缘体上硅光学器件测试的局部可擦除耦合器
DOI：
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发表时间：
2014
影响因子：
4.7
通讯作者：
G. Reed
中科院分区：
文献类型：
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作者：
R. Topley;G. Martinez;L. O’Faolain;N. Healy;S. Mailis;D. Thomson;F. Gardes;A. Peacock;D. Payne;G. Mashanovich;G. Reed
晶圆规模测试对于降低生产成本和提高产量至关重要。在这里，我们报告了一种允许在复杂的光学集成电路中测试单个光学元件的方法。该方法基于锗离子注入引起晶格损伤的衍射光栅耦合器。这些光栅可以通过局部激光退火来擦除，这表明在器件测试完成后，解耦效率降低了20 dB以上。激光退火是通过使用连续波激光器实现的，在可见波长下工作，从而降低了设备成本，并允许通过厚的氧化包层进行退火。所使用的工艺也保留了CMOS兼容性。
Wafer scale testing is critical to reducing production costs and increasing production yield. Here we report a method that allows testing of individual optical components within a complex optical integrated circuit. The method is based on diffractive grating couplers, fabricated using lattice damage induced by ion implantation of germanium. These gratings can be erased via localised laser annealing, which is shown to reduce the outcoupling efficiency by over 20 dB after the device testing is completed. Laser annealing was achieved by employing a CW laser, operating at visible wavelengths thus reducing equipment costs and allowing annealing through thick oxide claddings. The process used also retains CMOS compatibility.
影响因子：
4
作者：
Debnath, Kapil;Gardes, Frederic Y.;O'Faolain, Liam
通讯作者：
O'Faolain, Liam