III–V-N compounds for multi-junction solar cells on Si

III–V-N compounds for multi-junction solar cells on Si
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用于硅上多结太阳能电池的 III-V-N 化合物

DOI:
10.1109/pvsc.2014.6925509
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发表时间:
2014
期刊:
2014 IEEE 40th Photovoltaic Specialist Conference (PVSC)
影响因子:
--
通讯作者:
A. Wakahara
A. Wakahara
中科院分区:
--
文献类型:
--
作者:
K. Yamane;N. Urakami;H. Sekiguchi;A. Wakahara

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我们提出了一种GaPN/GaAsPN/Si多结太阳电池,其中所有层的晶格常数与Si底电池相匹配。GaP层在Si上的初始生长对抑制反相畴、层错、穿透位错和回熔腐蚀有重要作用。根据考虑应变效应的理论估计,通过GaAs0.2P0.74N0.06可以获得约1.65 eV的带隙能量,其满足与Si的晶格匹配条件。为了阐明这种材料体系的可能性,我们采用射频分子束外延技术在无结构缺陷的GaP/Si模板上生长了GaPN和GaAsPN。我们还研究差距(N)/Si异质结界面的钉扎态,以设计低损耗的隧穿结。
We proposed a GaPN/GaAsPN/Si multi-junction solar cell in which lattice constants for all layers matched to Si bottom cell. Initial growth of GaP layer on Si is an important role to suppress the anti-phase domain, stacking faults, threading dislocations and melt-back etching. According to theoretical estimation considering the strain effect, band-gap energy about 1.65 eV can be obtained by GaAs0.2P0.74N0.06 which satisfies the lattice-matching condition to Si. In order to clarify the possibility of this material system, we grew GaPN and GaAsPN on the structural defect-free GaP/Si template by using rf-MBE. We also investigated the pinning state at the GaP(N)/Si heterointerface to design a low-loss tunneling junction.
分子束外延生长的 n 型 GaPN 的电性能
DOI: --
发表时间: 2006
期刊: Applied Physics Letters Vol. 88,No. 14
影响因子: --
作者:
Y.Furukawa;H.Yonezu;A.Wakahara;Y.Yoshizumi;Y.Morita;A.Sato
通讯作者: A.Sato