Numerical and experimental analysis of patterning multi-period and multi-radius metasurfaces
Numerical and experimental analysis of patterning multi-period and multi-radius metasurfaces
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多周期、多半径超表面图案化的数值和实验分析
DOI:
10.1016/j.mtadv.2022.100247
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发表时间:
2022-06
影响因子:
10
通讯作者:
Xiangang Luo
中科院分区:
文献类型:
--
作者:
Haomiao Zhang;Ping Gao;Xiong Li;Mingbo Pu;Xiaoliang Ma;Yinghui Guo;Changtao Wang;Zeyu Zhao;Xiangang Luo
Plasmonic imaging technology can offer a novel way for nanofabrication, with the advantages of low-cost, high yield, and large area, having potentially promising applications in various nanostructures manufacturing. However, the previous studies mainly focus on the simulation and experimental research of fixed period or fixed structure size metasurface fabrication, which limits the range of its applications. In this paper, we proposed and analyzed the imaging characteristics of the reflective plasmonic structures, selected the best structure in the fabrication process by parameter analyses, and concluded that the air gap has the most significant influence on imaging quality of plasmonic imaging technology. Then we experimentally demonstrated its ability in fabricating multi-scale patterns. A 10mm × 16 mm large-scale structural color metasurface with periods from 414.3 to 580 nm has been designed and manufactured. Furthermore, the feasibility of fabricating metasurface whose radius varies from 75 to 150 nm is also verified under the same condition. The proposed method is expected to have widespread applications in multi-functional metasurface devices.
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影响因子:
14.1
作者:
Chonglei Zhang;Dongfang Zhang;Zhoupin Bian
通讯作者:
Zhoupin Bian
影响因子:
4
作者:
Gao, Ping;Yao, Na;Luo, Xiangang
通讯作者:
Luo, Xiangang
DOI:
10.1109/cstic49141.2020.9282436
发表时间:
2020-06
期刊:
2020 China Semiconductor Technology International Conference (CSTIC)
影响因子:
--
作者:
Qiang Wu;Yanli Li;Yushu Yang;Shoumian Chen;Yuhang Zhao
通讯作者:
Qiang Wu;Yanli Li;Yushu Yang;Shoumian Chen;Yuhang Zhao
DOI:
10.1117/12.2297316
发表时间:
2018-03
期刊:
--
影响因子:
--
作者:
H. Miyamoto;H. Furusato;K. Ishida;H. Tsushima;A. Kurosu;Hiroshi Tanaka;T. Ohta;Satoru Bushida;T. Saito;H. Mizoguchi
通讯作者:
H. Miyamoto;H. Furusato;K. Ishida;H. Tsushima;A. Kurosu;Hiroshi Tanaka;T. Ohta;Satoru Bushida;T. Saito;H. Mizoguchi
影响因子:
56.9
作者:
Fang, N;Lee, H;Zhang, X
通讯作者:
Zhang, X